Влияние потенциала смещения на структуру и распределение элементов в покрытиях нитрида титана полученных методом плазменно-иммерсионной имплантации
| Parent link: | Взаимодействие ионов с поверхностью, ВИП - 2015=Ion - surface interactions (ISI - 2015): труды XXII Международной конференции, 20-24 августа 2015, Москва/ под ред. Е. Ю. Зыкова ; П. А. Карасева ; А. И. Титова ; В. Е. Юрасова.— , 2015 Т. 3.— 2015.— [С. 94-97] |
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| Andre forfattere: | , , , , |
| Summary: | Заглавие с экрана TiN thin films were deposited on the well-polished 12X18Н10Т steel using arc ionplating technique. The influence of bias voltage on the structure and element distribution wasinvestigated. The results revealed that the deposited TiN film are crystalline and the preferred(111) orientation was observed as bias increased. Moreover, Ti/N ratio and the quantity andsize of microparticles decreased with the increase in bias voltage from -100 to -300 V. |
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2015
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| Online adgang: | http://plasma.mephi.ru/ru/uploads/files/conferences/ISI-2015/A5%20%20%20Volume_3.pdf#page=94 |
| Format: | Electronisk Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=647929 |
| Summary: | Заглавие с экрана TiN thin films were deposited on the well-polished 12X18Н10Т steel using arc ionplating technique. The influence of bias voltage on the structure and element distribution wasinvestigated. The results revealed that the deposited TiN film are crystalline and the preferred(111) orientation was observed as bias increased. Moreover, Ti/N ratio and the quantity andsize of microparticles decreased with the increase in bias voltage from -100 to -300 V. |
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