Effective processes for arc-plasma treatment in large vacuum chambers of technological facilities; IEEE Transactions on Plasma Science; Vol. 41, № 8

Effective processes for arc-plasma treatment in large vacuum chambers of technological facilities; IEEE Transactions on Plasma Science; Vol. 41, № 8

التفاصيل البيبلوغرافية
Parent link:IEEE Transactions on Plasma Science.— , 1973-
Vol. 41, № 8.— 2013.— [P. 2183-2195]
مؤلف مشترك: Национальный исследовательский Томский политехнический университет (ТПУ)
مؤلفون آخرون: Borisov D. P., Koval N. N. Nikolay Nikolaevich, Korotaev A. D., Kuznetsov V. M., Romanov V. Y., Terekhov P. A., Chulkov E. V.
الملخص:Title screen
Characteristics and design features of electrodesystems for sources of gas-discharge plasmas produced in anarc discharge in gas sustained by electron emission from a hotcathode and advanced vacuum-plasma facilities relying on themare presented. High values of the parameters and advantageousproperties of the plasmas generated by the proposed sourcesin large vacuum volumes are obtained. Effective techniquesand technological processes designed for surface modification ofmetal parts by the methods of cleaning, alloying (doping), andforming multicomponent composite coatings using low-pressurearc discharges are demonstrated.
Режим доступа: по договору с организацией-держателем ресурса
اللغة:الإنجليزية
منشور في: 2013
الموضوعات:
электронный ресурс
труды учёных ТПУ
дуговой разряд
источники плазмы
пробой вакуума
лечение
الوصول للمادة أونلاين:http://dx.doi.org/10.1109/TPS.2013.2247777
التنسيق: الكتروني فصل الكتاب
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=647890

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