Effective processes for arc-plasma treatment in large vacuum chambers of technological facilities; IEEE Transactions on Plasma Science; Vol. 41, № 8
| Parent link: | IEEE Transactions on Plasma Science.— , 1973- Vol. 41, № 8.— 2013.— [P. 2183-2195] |
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| Korporativní autor: | |
| Další autoři: | , , , , , , |
| Shrnutí: | Title screen Characteristics and design features of electrodesystems for sources of gas-discharge plasmas produced in anarc discharge in gas sustained by electron emission from a hotcathode and advanced vacuum-plasma facilities relying on themare presented. High values of the parameters and advantageousproperties of the plasmas generated by the proposed sourcesin large vacuum volumes are obtained. Effective techniquesand technological processes designed for surface modification ofmetal parts by the methods of cleaning, alloying (doping), andforming multicomponent composite coatings using low-pressurearc discharges are demonstrated. Режим доступа: по договору с организацией-держателем ресурса |
| Jazyk: | angličtina |
| Vydáno: |
2013
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| Témata: | |
| On-line přístup: | http://dx.doi.org/10.1109/TPS.2013.2247777 |
| Médium: | Elektronický zdroj Kapitola |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=647890 |