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Erratum to: Wettability of Thin Silicate-Containing Hydroxyapatite Films formed by RF-Magnetron Sputtering; Russian Physics Journal; Vol. 56, iss. 11

Erratum to: Wettability of Thin Silicate-Containing Hydroxyapatite Films formed by RF-Magnetron Sputtering

Bibliographic Details
Parent link:Russian Physics Journal
Vol. 56, iss. 11.— 2014.— [P. 1318]
Corporate Author: Национальный исследовательский Томский политехнический университет Физико-технический институт Кафедра теоретической и экспериментальной физики
Other Authors: Gorodzha S. N. Svetlana Nikolaevna, Surmeneva M. A. Maria Alexandrovna, Surmenev R. A. Roman Anatolievich, Gribennikov M. V., Pichugin V. F. Vladimir Fyodorovich, Sharonova A. A. Anna Aleksandrovna, Pustovalova A. A. Alla Aleksandrovna, Prymack O., Epple M., Wittmar A., Ulbricht M., Gogolinskii K. V., Kravchuk K. S.
Summary:Title screen
Режим доступа: по договору с организацией-держателем ресурса
Language:English
Published: 2014
Subjects:
электронный ресурс
труды учёных ТПУ
physical-chemical properties
RF-magnetron sputtering
физико-химические свойства
ВЧ-магнетронное распыление
пленки
Online Access:http://dx.doi.org/10.1007/s11182-014-0180-3
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=647463
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http://dx.doi.org/10.1007/s11182-014-0180-3

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