Optical and AFM studies on p-SNS thin films deposited by magnetron sputtering

Optical and AFM studies on p-SNS thin films deposited by magnetron sputtering

Bibliographic Details
Parent link:	Chalcogenide Letters Vol. 12, iss. 9.— 2015.— [P. 483-487]
Main Author:	An V. V. Vladimir Vilorievich
Corporate Authors:	Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Лаборатория № 12, Национальный исследовательский Томский политехнический университет
Other Authors:	Dronova M. V. Mariya Vladimirovna, Zakharov A. N. Aleksandr Nikolaevich
Summary:	Title screen Tin sulfide thin films were prepared by DC magnetron sputtering of a nanostructured SnS target in argon. The obtained samples were analyzed using atomic force microscopy (AFM), radio frequency glow discharge optical emission spectroscopy (RF-GD-OES) and UV-vis spectrophotometry. The thickness, roughness and surface porosity were evaluated using module software for AFM data visualization and analysis Gwyddion. A thin film growth mechanism was suggested based on the analysis of the AFM images. Режим доступа: по договору с организацией-держателем ресурса
Published:	2015
Subjects:	труды учёных ТПУ электронный ресурс атомно-силовая микроскопия магнетронное распыление
Online Access:	http://elibrary.ru/item.asp?id=24960333
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645775

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