High-power ion beam sources for industrial application
| Parent link: | Surface and Coatings Technology: Scientific Journal Vol. 96, iss. 1.— 1997.— [P. 103-109] |
|---|---|
| Інші автори: | , , , , , , , , , |
| Резюме: | Title screen Two sources of high-power ion beams of nanosecond duration are described, a MUK and a TEMP unit They generated ions with energies of up to 150 and 300 keV, respectively, and the pulse duration was 20-200 and 50 ns, respectively. For the MUK unit, beam parameters for heavy ion implantation (Aln+ , Mgn+ , Fen+ , Wn+ , etc.) were as follows: current density ranging from 1 to 10 A cm-2 and total ion flux energy up to 20 J. For the TEMP unit, the following beam parameters were used for H+ and Cn+ ions: current density 40-200 A cm-2 and total ion flux energy 0.3-0.5 kJ. The sources are powered by various diode systems and can be applied in material science for scientific research and technology. Режим доступа: по договору с организацией-держателем ресурса |
| Мова: | Англійська |
| Опубліковано: |
1997
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| Предмети: | |
| Онлайн доступ: | http://dx.doi.org/10.1016/S0257-8972(97)00116-3 |
| Формат: | Електронний ресурс Частина з книги |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645330 |
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| 200 | 1 | |a High-power ion beam sources for industrial application |f G. E. Remnev [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: p. 109 (13 tit.)] | ||
| 330 | |a Two sources of high-power ion beams of nanosecond duration are described, a MUK and a TEMP unit They generated ions with energies of up to 150 and 300 keV, respectively, and the pulse duration was 20-200 and 50 ns, respectively. For the MUK unit, beam parameters for heavy ion implantation (Aln+ , Mgn+ , Fen+ , Wn+ , etc.) were as follows: current density ranging from 1 to 10 A cm-2 and total ion flux energy up to 20 J. For the TEMP unit, the following beam parameters were used for H+ and Cn+ ions: current density 40-200 A cm-2 and total ion flux energy 0.3-0.5 kJ. The sources are powered by various diode systems and can be applied in material science for scientific research and technology. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Surface and Coatings Technology |o Scientific Journal | ||
| 463 | |t Vol. 96, iss. 1 |v [P. 103-109] |d 1997 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a high-power ion beams | |
| 610 | 1 | |a short pulse ion implantation | |
| 610 | 1 | |a surface modification | |
| 701 | 1 | |a Remnev (Remnyov) |b G. E. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1948- |g Gennady Efimovich |3 (RuTPU)RU\TPU\pers\31500 |9 15661 | |
| 701 | 1 | |a Isakov |b I. F. | |
| 701 | 1 | |a Opekounov |b M. S. | |
| 701 | 1 | |a Kotlyarevsky |b G. I. | |
| 701 | 1 | |a Kutuzov |b V. L. | |
| 701 | 1 | |a Lopatin |b V. S. | |
| 701 | 1 | |a Matvienko |b V. M. | |
| 701 | 1 | |a Ovsyannikov |b M. Y. | |
| 701 | 1 | |a Potyomkin |b A. V. | |
| 701 | 1 | |a Tarbokov |b V. A. |c specialist in the field of material science |c Leading engineer of Tomsk Polytechnic University, Candidate of technical sciences |f 1969- |g Vladislav Aleksandrovich |3 (RuTPU)RU\TPU\pers\41878 | |
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| 856 | 4 | |u http://dx.doi.org/10.1016/S0257-8972(97)00116-3 | |
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