High-power ion beam sources for industrial application
| Parent link: | Surface and Coatings Technology: Scientific Journal Vol. 96, iss. 1.— 1997.— [P. 103-109] |
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| Other Authors: | , , , , , , , , , |
| Summary: | Title screen Two sources of high-power ion beams of nanosecond duration are described, a MUK and a TEMP unit They generated ions with energies of up to 150 and 300 keV, respectively, and the pulse duration was 20-200 and 50 ns, respectively. For the MUK unit, beam parameters for heavy ion implantation (Aln+ , Mgn+ , Fen+ , Wn+ , etc.) were as follows: current density ranging from 1 to 10 A cm-2 and total ion flux energy up to 20 J. For the TEMP unit, the following beam parameters were used for H+ and Cn+ ions: current density 40-200 A cm-2 and total ion flux energy 0.3-0.5 kJ. The sources are powered by various diode systems and can be applied in material science for scientific research and technology. Режим доступа: по договору с организацией-держателем ресурса |
| Published: |
1997
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| Subjects: | |
| Online Access: | http://dx.doi.org/10.1016/S0257-8972(97)00116-3 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=645330 |