Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser

Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser

Bibliographic Details
Parent link:Journal of Physics D: Applied Physics.— , 1968-
Vol. 47, iss. 40.— 2014.— [405205]
Corporate Author: Национальный исследовательский Томский политехнический университет
Other Authors: Pira P., Burian T., Kolpakova A., Tichy M. Milan, Kudrna P., Danis S., Juha L., Lancok J., Vysin L., Civis S., Zelinger Z., Kubat P., Wild J.
Summary:Title screen
Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1–3 eV and ~1013–1014 m?3, respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target.
Режим доступа: по договору с организацией-держателем ресурса
Language:English
Published: 2014
Subjects:
электронный ресурс
труды учёных ТПУ
Online Access:http://dx.doi.org/10.1088/0022-3727/47/40/405205
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=644903

Similar Items

Similar Items