Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser
| Parent link: | Journal of Physics D: Applied Physics.— , 1968- Vol. 47, iss. 40.— 2014.— [405205] |
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| Weitere Verfasser: | , , , , , , , , , , , , |
| Zusammenfassung: | Title screen Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1–3 eV and ~1013–1014 m?3, respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target. Режим доступа: по договору с организацией-держателем ресурса |
| Sprache: | Englisch |
| Veröffentlicht: |
2014
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| Online-Zugang: | http://dx.doi.org/10.1088/0022-3727/47/40/405205 |
| Format: | Elektronisch Buchkapitel |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=644903 |