Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser; Journal of Physics D: Applied Physics; Vol. 47, iss. 40
| Parent link: | Journal of Physics D: Applied Physics.— , 1968- Vol. 47, iss. 40.— 2014.— [405205] |
|---|---|
| مؤلف مشترك: | |
| مؤلفون آخرون: | , , , , , , , , , , , , |
| الملخص: | Title screen Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1–3 eV and ~1013–1014 m?3, respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target. Режим доступа: по договору с организацией-держателем ресурса |
| اللغة: | الإنجليزية |
| منشور في: |
2014
|
| الموضوعات: | |
| الوصول للمادة أونلاين: | http://dx.doi.org/10.1088/0022-3727/47/40/405205 |
| التنسيق: | الكتروني فصل الكتاب |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=644903 |
MARC
| LEADER | 00000nla0a2200000 4500 | ||
|---|---|---|---|
| 001 | 644903 | ||
| 005 | 20250513163640.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\9987 | ||
| 035 | |a RU\TPU\network\7809 | ||
| 090 | |a 644903 | ||
| 100 | |a 20151203d2014 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 102 | |a GB | ||
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Langmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser |f P. Pira, T. Burian, A. Kolpakova [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 330 | |a Properties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1–3 eV and ~1013–1014 m?3, respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Journal of Physics D: Applied Physics |d 1968- | ||
| 463 | |t Vol. 47, iss. 40 |v [405205] |d 2014 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 701 | 1 | |a Pira |b P. | |
| 701 | 1 | |a Burian |b T. | |
| 701 | 1 | |a Kolpakova |b A. | |
| 701 | 1 | |a Tichy |b M. |c chemist |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |f 1947- |g Milan |3 (RuTPU)RU\TPU\pers\35771 | |
| 701 | 1 | |a Kudrna |b P. | |
| 701 | 1 | |a Danis |b S. | |
| 701 | 1 | |a Juha |b L. | |
| 701 | 1 | |a Lancok |b J. | |
| 701 | 1 | |a Vysin |b L. | |
| 701 | 1 | |a Civis |b S. | |
| 701 | 1 | |a Zelinger |b Z. | |
| 701 | 1 | |a Kubat |b P. | |
| 701 | 1 | |a Wild |b J. | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |c (2009- ) |9 26305 |
| 801 | 2 | |a RU |b 63413507 |c 20210616 |g RCR | |
| 850 | |a 63413507 | ||
| 856 | 4 | |u http://dx.doi.org/10.1088/0022-3727/47/40/405205 | |
| 942 | |c CF | ||