Macroparticles number density decreasing on a substrate immersed in vacuum arc plasma at repetitively pulsed biasing
| Parent link: | Известия вузов. Физика: научный журнал.— , 1957- Т. 57, № 12/3.— 2014.— [P. 259-262] |
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| Corporate Authors: | , |
| Andre forfattere: | , , , , |
| Summary: | Title screen The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10 % of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20 % is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters. Режим доступа: по договору с организацией-держателем ресурса |
| Sprog: | engelsk |
| Udgivet: |
2014
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| Fag: | |
| Online adgang: | http://elibrary.ru/item.asp?id=23815795 |
| Format: | Electronisk Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=644268 |
MARC
| LEADER | 00000nla0a2200000 4500 | ||
|---|---|---|---|
| 001 | 644268 | ||
| 005 | 20250310141014.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\9333 | ||
| 035 | |a RU\TPU\network\9045 | ||
| 090 | |a 644268 | ||
| 100 | |a 20151106d2014 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Macroparticles number density decreasing on a substrate immersed in vacuum arc plasma at repetitively pulsed biasing |f A. I. Ryabchikov [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: p. 262 (9 tit.)] | ||
| 330 | |a The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10 % of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20 % is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Известия вузов. Физика |o научный журнал |d 1957- | ||
| 463 | |t Т. 57, № 12/3 |v [P. 259-262] |d 2014 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a вакуумно-дуговые источники | |
| 610 | 1 | |a макрочастицы | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Sivin |b D. O. |c physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences |f 1978- |g Denis Olegovich |3 (RuTPU)RU\TPU\pers\34240 | |
| 701 | 1 | |a Bumagina |b A. I. |c physicist |c Associate Scientist of Tomsk Polytechnic University |f 1987- |g Anna Ivanovna |3 (RuTPU)RU\TPU\pers\34326 |9 17835 | |
| 701 | 1 | |a Ananin |b P. S. |c physicist |c senior researcher of Tomsk Polytechnic University, candidate of physical and mathematical sciences |f 1942- |g Petr Semenovich |3 (RuTPU)RU\TPU\pers\35673 | |
| 701 | 1 | |a Dektyarev |b S. V. |c physicist |c design engineer of Tomsk Polytechnic University |f 1957- |g Sergey Valentinovich |3 (RuTPU)RU\TPU\pers\35672 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Физико-технический институт (ФТИ) |b Лаборатория № 22 |3 (RuTPU)RU\TPU\col\19225 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Физико-технический институт (ФТИ) |b Центр измерений свойств материалов (ЦИСМ) |3 (RuTPU)RU\TPU\col\19361 |
| 801 | 2 | |a RU |b 63413507 |c 20191106 |g RCR | |
| 856 | 4 | |u http://elibrary.ru/item.asp?id=23815795 | |
| 942 | |c CF | ||