Macroparticles number density decreasing on a substrate immersed in vacuum arc plasma at repetitively pulsed biasing
| Parent link: | Известия вузов. Физика: научный журнал.— , 1957- Т. 57, № 12/3.— 2014.— [P. 259-262] |
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| Korporace: | , |
| Další autoři: | , , , , |
| Shrnutí: | Title screen The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10 % of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20 % is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters. Режим доступа: по договору с организацией-держателем ресурса |
| Jazyk: | angličtina |
| Vydáno: |
2014
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| Témata: | |
| On-line přístup: | http://elibrary.ru/item.asp?id=23815795 |
| Médium: | Elektronický zdroj Kapitola |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=644268 |