Interaction of Al2O3 thin films deposited on nanocrystalline titanium with hydrogen; Thin Solid Films; Vol. 591, pt. В : Selected papers from 16th International Conference on Thin Films, October 13-16, 2014, Dubrovnik, Croatia
| Parent link: | Thin Solid Films.— , 1967- Vol. 591, pt. В : Selected papers from 16th International Conference on Thin Films, October 13-16, 2014, Dubrovnik, Croatia.— 2014.— [P. 169-173] |
|---|---|
| Співавтори: | Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра общей физики (ОФ), Национальный исследовательский Томский политехнический университет (ТПУ) Институт природных ресурсов (ИПР) Кафедра гидрогеологии, инженерной геологии и гидрогеоэкологии (ГИГЭ), Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Центр измерений свойств материалов (ЦИСМ) |
| Інші автори: | Nikitenkov N. N. Nikolai Nikolaevich, Vilkhivskaya O. V. Olga Vladimirovna, Nikitenkov A. N. Aleksey Nikolaevich, Tyurin Yu. I. Yuri Ivanovich, Sypchenko V. S. Vladimir Sergeevich, Shulepov I. A. Ivan Anisimovich |
| Резюме: | Title screen The aim of the present study is to investigate hydrogen permeation through an aluminium oxide coating Al2O3,which was deposited on the nanocrystalline titanium (NCTi) using two methods: deposition from a substrate saturatedwith hydrogen, and saturation of Al2O3/NCTi system from an ambient medium (electrolyte, gas, plasma).Films were deposited onto the surface of specimens by magnetron sputtering. While performing the deposition,hydrogen diffused throughout the depth of the film; however, diffusion was restricted to the area near the film–substrate interface, affecting less than 50% of the thickness of the film. Film–substrate interface is significantlybroader (compared to the deposition on an unsaturated substrate), and metallic hydroxides are formed in theinterface. Saturation of Al2O3/NC Ti system with hydrogen was performed using three methods: electrolyticmethod, saturation from the high-frequency discharge hydrogen plasma, and from hydrogen atmosphere athigh temperature and pressure. The analysis of the saturation process shows that the Al2O3 coating can protectthe metal surface from hydrogen permeation only in the case of its operation in the conditions of contact withaqueous solutions. Режим доступа: по договору с организацией-держателем ресурса |
| Мова: | Англійська |
| Опубліковано: |
2014
|
| Предмети: | |
| Онлайн доступ: | http://dx.doi.org/10.1016/j.tsf.2015.04.011 |
| Формат: | Електронний ресурс Частина з книги |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=643963 |
Схожі ресурси
Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films; Thin Solid Films; Vol. 591, pt. В : Selected papers from 16th International Conference on Thin Films, October 13-16, 2014, Dubrovnik, Croatia
Опубліковано: (2015)
Опубліковано: (2015)
Solid oxide fuel cell anode surface modification by magnetron sputtering of NiO/YSZ thin film; Energy Fluxes and Radiation Effects (EFRE-2016)
Опубліковано: (2016)
Опубліковано: (2016)
Effect of Al Addition on the Oxidation Resistance of HfC Thin Films; Coatings; Vol. 12, iss. 1
Опубліковано: (2022)
Опубліковано: (2022)
Silver-Containing Thin Films on Transparent Polymer Foils for Antimicrobial Applications; Coatings; Vol. 12, iss. 2
Опубліковано: (2022)
Опубліковано: (2022)
On the Application of Oxynitride Thin Films in Biomedicine; Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques; Vol. 18, iss. 1 supplement
Опубліковано: (2024)
Опубліковано: (2024)
Fabrication of customizable wedged multilayer Laue lenses by adding a stress layer; Thin Solid Films; Vol. 571, pt. 2
Опубліковано: (2015)
Опубліковано: (2015)
Study of ceria thin films prepared via electrochemical deposition : Role of selected electrochemical parameters on growth kinetics; Thin Solid Films; Vol. 693
Опубліковано: (2019)
Опубліковано: (2019)
Wettability of Thin Silicate-Containing Hydroxyapatite Films Formed by RF-Magnetron Sputtering; Russian Physics Journal; Vol. 56, iss. 10
Опубліковано: (2014)
Опубліковано: (2014)
Erratum to: Wettability of Thin Silicate-Containing Hydroxyapatite Films formed by RF-Magnetron Sputtering; Russian Physics Journal; Vol. 56, iss. 11
Опубліковано: (2014)
Опубліковано: (2014)
Effects of sputtering gas on the microstructure of Ir thin films deposited by HiPIMS and pulsed DC sputtering; Surface and Coatings Technology; Vol. 412
за авторством: Zenkin S. P. Sergey Petrovich
Опубліковано: (2021)
за авторством: Zenkin S. P. Sergey Petrovich
Опубліковано: (2021)
Influence of short-pulsed Ion irradiation on optical and photoelectrical properties of thin gallium oxide films; Optical Materials: X; Vol. 25
Опубліковано: (2025)
Опубліковано: (2025)
Thermal stability of a-C:H:SiOx thin films in hydrogen atmosphere; Thin Solid Films; Vol. 690
Опубліковано: (2019)
Опубліковано: (2019)
Influence of Nitrogen on Corrosion Resistance of Thin Ti–O–N Films Deposited by Reactive Magnetron Sputtering; Inorganic Materials: Applied Research; Vol. 12, iss. 4
за авторством: Boytsova E. L. Elena Lvovna
Опубліковано: (2021)
за авторством: Boytsova E. L. Elena Lvovna
Опубліковано: (2021)
Modification of optical and photoelectrical properties of thin gallium oxide films by intense pulsed 200 keV C+ ion beams; Optical Materials: X; Vol. 25
Опубліковано: (2025)
Опубліковано: (2025)
Formation and structural features of nitrogen-doped titanium dioxide thin films grown by reactive magnetron sputtering; Applied Surface Science; Vol. 534
Опубліковано: (2020)
Опубліковано: (2020)
Influence of the elemental composition on the structural and mechanical characteristics of entropy-stabilized HfZrCeYMgAlO thin films prepared by reactive magnetron sputtering; Ceramics International; Vol. 50, iss. 18, Pt. A
Опубліковано: (2024)
Опубліковано: (2024)
Nitrogen-Doped Titanium Dioxide Thin Films Formation on the Surface of PLLA Electrospun Microfibers Scaffold by Reactive Magnetron Sputtering Method; Plasma Chemistry and Plasma Processing; Vol. 39, iss. 2
Опубліковано: (2019)
Опубліковано: (2019)
Thin Films Science and Technology; V. 2 : Size Effects in Thin Films
за авторством: Tellier C. R.
Опубліковано: (Amsterdam, Elsevier Science Publishing Company, Inc., 1982)
за авторством: Tellier C. R.
Опубліковано: (Amsterdam, Elsevier Science Publishing Company, Inc., 1982)
Effect of nitrogen-doping and post annealing on wettability and band gap energy of TiO2 thin film; Applied Surface Science; Vol. 500
Опубліковано: (2020)
Опубліковано: (2020)
Polyether Ether Ketone Coated with Ultra-Thin Films of Titanium Oxide and Zirconium Oxide Fabricated by DC Magnetron Sputtering for Biomedical Application; Materials; Vol. 15, iss. 22
Опубліковано: (2022)
Опубліковано: (2022)
Recent Advances in Thin Film Photovoltaics
Опубліковано: (2022)
Опубліковано: (2022)
Thin-Film Deposition: Principles and Practice
за авторством: Smith D. L. Donald L.
Опубліковано: (Boston, McGraw Hill, 1995)
за авторством: Smith D. L. Donald L.
Опубліковано: (Boston, McGraw Hill, 1995)
Fundamentals of Surface and Thin Film Analysis
за авторством: Feldman L. C. Leonard
Опубліковано: (New York, North-Holland, 1986)
за авторством: Feldman L. C. Leonard
Опубліковано: (New York, North-Holland, 1986)
Effect of substrate bias and substrate/plasma generator distance on properties of a-C:H:SiOx films synthesized by PACVD; Thin Solid Films; Vol. 669
Опубліковано: (2019)
Опубліковано: (2019)
Analysis of Thermal-Induced Microstructural Changes in Nanoscale Zr/Nb Metal Layers after Proton Irradiation; Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques; Vol. 18
Опубліковано: (2024)
Опубліковано: (2024)
Preparation of nickel-containing conductive amorphous carbon films by magnetron sputtering with negative high-voltage pulsed substrate bias; Thin Solid Films; Vol. 650
Опубліковано: (2018)
Опубліковано: (2018)
Comparison of gaseous contamination of thin tungsten and gold coatings deposited from ablated plasma generated by Intense Pulsed Ion Beams; Thin Solid Films; Vol. 758
за авторством: Ryzhkov V. A. Vladislav Andreevich
Опубліковано: (2022)
за авторством: Ryzhkov V. A. Vladislav Andreevich
Опубліковано: (2022)
Thin Films and Multilayers for Electronics: study aid
Опубліковано: (Tomsk, TPU Publishing House, 2009)
Опубліковано: (Tomsk, TPU Publishing House, 2009)
Thin Films and Multilayers for Electronics: study aid
Опубліковано: (Tomsk, TPU Publishing House, 2009)
Опубліковано: (Tomsk, TPU Publishing House, 2009)
Spatially Resolved Characterization in Thin-Film Photovoltaics
за авторством: Bokalič, Matevž, та інші
Опубліковано: (2015)
за авторством: Bokalič, Matevž, та інші
Опубліковано: (2015)
Handbook of the Physics of Thin-Film Solar Cells
за авторством: Böer, Karl W.
Опубліковано: (2013)
за авторством: Böer, Karl W.
Опубліковано: (2013)
The release of nickel from nickel-titanium (NiTi) is strongly reduced by a sub-micrometer thin layer of calcium phosphate deposited by rf-magnetron sputtering; Journal of Materials Science: Materials in Medicine; Vol. 21, iss. 4
Опубліковано: (2010)
Опубліковано: (2010)
Structural features of N-containing titanium dioxide thin films deposited by magnetron sputtering; Thin Solid Films; Vol. 627
Опубліковано: (2017)
Опубліковано: (2017)
Properties of ultra-thin Cu films grown by high power pulsed magnetron sputtering; Thin Solid Films; Vol. 631
Опубліковано: (2017)
Опубліковано: (2017)
Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties; Surface and Coatings Technology; Vol. 375
Опубліковано: (2019)
Опубліковано: (2019)
The properties of Cu films deposited by high rate magnetron sputtering from a liquid target; Vacuum; Vol. 169
Опубліковано: (2019)
Опубліковано: (2019)
Modern Technologies for Creating the Thin-film Systems and Coatings
Опубліковано: (Rijeka, InTech, 2017)
Опубліковано: (Rijeka, InTech, 2017)
Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets; Surface Modification of Materials by Ion Beams (SMMIB-2019)
Опубліковано: (2019)
Опубліковано: (2019)
The covalent functionalization of few-layered MoTe2 thin films with iodonium salts; Materials Today Chemistry; Vol. 24
Опубліковано: (2022)
Опубліковано: (2022)
Soft-Matter Thin Film Solar Cells Physical Processes and Device Simulation
за авторством: Ren, Jingzheng
Опубліковано: (2020)
за авторством: Ren, Jingzheng
Опубліковано: (2020)
Схожі ресурси
-
Influence of deposition conditions on the composition, texture and microstructure of RF-magnetron sputter-deposited hydroxyapatite thin films; Thin Solid Films; Vol. 591, pt. В : Selected papers from 16th International Conference on Thin Films, October 13-16, 2014, Dubrovnik, Croatia
Опубліковано: (2015) -
Solid oxide fuel cell anode surface modification by magnetron sputtering of NiO/YSZ thin film; Energy Fluxes and Radiation Effects (EFRE-2016)
Опубліковано: (2016) -
Effect of Al Addition on the Oxidation Resistance of HfC Thin Films; Coatings; Vol. 12, iss. 1
Опубліковано: (2022) -
Silver-Containing Thin Films on Transparent Polymer Foils for Antimicrobial Applications; Coatings; Vol. 12, iss. 2
Опубліковано: (2022) -
On the Application of Oxynitride Thin Films in Biomedicine; Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques; Vol. 18, iss. 1 supplement
Опубліковано: (2024)