Interaction of Al2O3 thin films deposited on nanocrystalline titanium with hydrogen
| Parent link: | Thin Solid Films.— , 1967- Vol. 591, pt. В : Selected papers from 16th International Conference on Thin Films, October 13-16, 2014, Dubrovnik, Croatia.— 2014.— [P. 169-173] |
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| מחברים אחרים: | , , , , , |
| סיכום: | Title screen The aim of the present study is to investigate hydrogen permeation through an aluminium oxide coating Al2O3,which was deposited on the nanocrystalline titanium (NCTi) using two methods: deposition from a substrate saturatedwith hydrogen, and saturation of Al2O3/NCTi system from an ambient medium (electrolyte, gas, plasma).Films were deposited onto the surface of specimens by magnetron sputtering. While performing the deposition,hydrogen diffused throughout the depth of the film; however, diffusion was restricted to the area near the film–substrate interface, affecting less than 50% of the thickness of the film. Film–substrate interface is significantlybroader (compared to the deposition on an unsaturated substrate), and metallic hydroxides are formed in theinterface. Saturation of Al2O3/NC Ti system with hydrogen was performed using three methods: electrolyticmethod, saturation from the high-frequency discharge hydrogen plasma, and from hydrogen atmosphere athigh temperature and pressure. The analysis of the saturation process shows that the Al2O3 coating can protectthe metal surface from hydrogen permeation only in the case of its operation in the conditions of contact withaqueous solutions. Режим доступа: по договору с организацией-держателем ресурса |
| שפה: | אנגלית |
| יצא לאור: |
2014
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| נושאים: | |
| גישה מקוונת: | http://dx.doi.org/10.1016/j.tsf.2015.04.011 |
| פורמט: | אלקטרוני Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=643963 |