Interaction of Al2O3 thin films deposited on nanocrystalline titanium with hydrogen; Thin Solid Films; Vol. 591, pt. В : Selected papers from 16th International Conference on Thin Films, October 13-16, 2014, Dubrovnik, Croatia

Chi tiết về thư mục
Parent link:Thin Solid Films.— , 1967-
Vol. 591, pt. В : Selected papers from 16th International Conference on Thin Films, October 13-16, 2014, Dubrovnik, Croatia.— 2014.— [P. 169-173]
Nhiều tác giả của công ty: Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра общей физики (ОФ), Национальный исследовательский Томский политехнический университет (ТПУ) Институт природных ресурсов (ИПР) Кафедра гидрогеологии, инженерной геологии и гидрогеоэкологии (ГИГЭ), Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Центр измерений свойств материалов (ЦИСМ)
Tác giả khác: Nikitenkov N. N. Nikolai Nikolaevich, Vilkhivskaya O. V. Olga Vladimirovna, Nikitenkov A. N. Aleksey Nikolaevich, Tyurin Yu. I. Yuri Ivanovich, Sypchenko V. S. Vladimir Sergeevich, Shulepov I. A. Ivan Anisimovich
Tóm tắt:Title screen
The aim of the present study is to investigate hydrogen permeation through an aluminium oxide coating Al2O3,which was deposited on the nanocrystalline titanium (NCTi) using two methods: deposition from a substrate saturatedwith hydrogen, and saturation of Al2O3/NCTi system from an ambient medium (electrolyte, gas, plasma).Films were deposited onto the surface of specimens by magnetron sputtering. While performing the deposition,hydrogen diffused throughout the depth of the film; however, diffusion was restricted to the area near the film–substrate interface, affecting less than 50% of the thickness of the film. Film–substrate interface is significantlybroader (compared to the deposition on an unsaturated substrate), and metallic hydroxides are formed in theinterface. Saturation of Al2O3/NC Ti system with hydrogen was performed using three methods: electrolyticmethod, saturation from the high-frequency discharge hydrogen plasma, and from hydrogen atmosphere athigh temperature and pressure. The analysis of the saturation process shows that the Al2O3 coating can protectthe metal surface from hydrogen permeation only in the case of its operation in the conditions of contact withaqueous solutions.
Режим доступа: по договору с организацией-держателем ресурса
Ngôn ngữ:Tiếng Anh
Được phát hành: 2014
Những chủ đề:
Truy cập trực tuyến:http://dx.doi.org/10.1016/j.tsf.2015.04.011
Định dạng: Điện tử Chương của sách
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=643963

MARC

LEADER 00000naa0a2200000 4500
001 643963
005 20250606145942.0
035 |a (RuTPU)RU\TPU\network\8978 
090 |a 643963 
100 |a 20151019d2014 k y0engy50 ba 
101 0 |a eng 
102 |a NL 
135 |a drcn ---uucaa 
181 0 |a i  
182 0 |a b 
200 1 |a Interaction of Al2O3 thin films deposited on nanocrystalline titanium with hydrogen  |f N. N. Nikitenkov [et al.] 
203 |a Text  |c electronic 
300 |a Title screen 
320 |a [References: p. 173 (21 tit.)] 
330 |a The aim of the present study is to investigate hydrogen permeation through an aluminium oxide coating Al2O3,which was deposited on the nanocrystalline titanium (NCTi) using two methods: deposition from a substrate saturatedwith hydrogen, and saturation of Al2O3/NCTi system from an ambient medium (electrolyte, gas, plasma).Films were deposited onto the surface of specimens by magnetron sputtering. While performing the deposition,hydrogen diffused throughout the depth of the film; however, diffusion was restricted to the area near the film–substrate interface, affecting less than 50% of the thickness of the film. Film–substrate interface is significantlybroader (compared to the deposition on an unsaturated substrate), and metallic hydroxides are formed in theinterface. Saturation of Al2O3/NC Ti system with hydrogen was performed using three methods: electrolyticmethod, saturation from the high-frequency discharge hydrogen plasma, and from hydrogen atmosphere athigh temperature and pressure. The analysis of the saturation process shows that the Al2O3 coating can protectthe metal surface from hydrogen permeation only in the case of its operation in the conditions of contact withaqueous solutions. 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
461 |t Thin Solid Films  |d 1967- 
463 |t Vol. 591, pt. В : Selected papers from 16th International Conference on Thin Films, October 13-16, 2014, Dubrovnik, Croatia  |v [P. 169-173]  |d 2014 
610 1 |a электронный ресурс 
610 1 |a films 
610 1 |a nanocrystalline titanium 
610 1 |a hydrogen 
610 1 |a magnetron sputtering 
610 1 |a layers 
610 1 |a spectroscopy 
701 1 |a Nikitenkov  |b N. N.  |c Russian physicist  |c Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences  |f 1953-  |g Nikolai Nikolaevich  |3 (RuTPU)RU\TPU\pers\30409  |9 14751 
701 1 |a Vilkhivskaya  |b O. V.  |g Olga Vladimirovna 
701 1 |a Nikitenkov  |b A. N.  |c physicist, hydrogeologist  |c associate Professor of Tomsk Polytechnic University, candidate of geological and mineralogical Sciences  |f 1983-  |g Aleksey Nikolaevich  |3 (RuTPU)RU\TPU\pers\33263  |9 17008 
701 1 |a Tyurin  |b Yu. I.  |c physicist  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences (DSc).  |f 1950-  |g Yuri Ivanovich  |3 (RuTPU)RU\TPU\pers\29895  |9 14367 
701 1 |a Sypchenko  |b V. S.  |c physicist  |c Associate Professor of Tomsk Polytechnic University, Candidate of Sciences  |f 1987-  |g Vladimir Sergeevich  |3 (RuTPU)RU\TPU\pers\33791  |9 17389 
701 1 |a Shulepov  |b I. A.  |c physicist  |c Engineer-designer of Tomsk Polytechnic University, Candidate of physical and mathematical sciences  |f 1954-  |g Ivan Anisimovich  |3 (RuTPU)RU\TPU\pers\33092 
712 0 2 |a Национальный исследовательский Томский политехнический университет (ТПУ)  |b Физико-технический институт (ФТИ)  |b Кафедра общей физики (ОФ)  |3 (RuTPU)RU\TPU\col\18734 
712 0 2 |a Национальный исследовательский Томский политехнический университет (ТПУ)  |b Институт природных ресурсов (ИПР)  |b Кафедра гидрогеологии, инженерной геологии и гидрогеоэкологии (ГИГЭ)  |3 (RuTPU)RU\TPU\col\18664 
712 0 2 |a Национальный исследовательский Томский политехнический университет (ТПУ)  |b Физико-технический институт (ФТИ)  |b Центр измерений свойств материалов (ЦИСМ)  |3 (RuTPU)RU\TPU\col\19361 
801 2 |a RU  |b 63413507  |c 20151019  |g RCR 
850 |a 63413507 
856 4 |u http://dx.doi.org/10.1016/j.tsf.2015.04.011 
942 |c CF