Cellular automata modeling of microcrystalline structure formation

Bibliographic Details
Parent link:AIP Conference Proceedings
Vol. 1623 : International Conference on Physical Mesomechanics of Multilevel Systems 2014, Tomsk, Russia, 3–5 September 2014.— 2014.— [P. 419-422]
Main Author: Mikolaychuk M. Mikhail
Corporate Author: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Кафедра физики высоких технологий в машиностроении (ФВТМ)
Other Authors: Knyazeva A. G. Anna Georgievna
Summary:Title screen
The paper discusses the problem of microcrystalline structure formation during magnetron sputtering. The authors suggest the model based on cellular automata approach combined with chemical kinetics considerations, briefly discuss a practical way for kinetic constants evaluation and derive their accurate values. The work numerically solves a particular problem of coating formation by magnetron sputter deposition in multicomponent chemically active plasma.
Режим доступа: по договору с организацией-держателем ресурса
Published: 2014
Subjects:
Online Access:http://dx.doi.org/10.1063/1.4898971
http://earchive.tpu.ru/handle/11683/35730
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=641874