Bias-assisted magnetron sputtering of yttria-stabilised zirconia thin films; Journal of Physics: Conference Series; Vol. 552 : International Congress on Energy Fluxes and Radiation Effects (EFRE-2014), 21–26 September 2014, Tomsk, Russia

Bias-assisted magnetron sputtering of yttria-stabilised zirconia thin films; Journal of Physics: Conference Series; Vol. 552 : International Congress on Energy Fluxes and Radiation Effects (EFRE-2014), 21–26 September 2014, Tomsk, Russia

Opis bibliograficzny
Parent link:	Journal of Physics: Conference Series Vol. 552 : International Congress on Energy Fluxes and Radiation Effects (EFRE-2014), 21–26 September 2014, Tomsk, Russia.— 2014.— [ 012010, 6 p.]
Korporacja:	Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра водородной энергетики и плазменных технологий (ВЭПТ)
Kolejni autorzy:	Soloviev A. A. Andrey Aleksandrovich, Rabotkin S. V., Ionov I. V. Igor Vyacheslavovich, Shipilova A. V. Anna Viktorovna, Kovalchuk A. N. Anastasia Nikolaevna, Borduleva A. O. Alena Olegovna
Streszczenie:	Title screen Cubic yttria-stabilized zirconia (YSZ) thin films were deposited by reactive magnetron sputtering on NiO-YSZ fuel cell anodes under different conditions. The influence of substrate bias voltage, temperature and porosity on texture and morphology of the deposited films were investigated. Comparing film morphology of YSZ grown on NiO-YSZ anodes, it was found that films deposited on a substrate with a large porosity were columnar and contained voids regardless of the deposition parameters. It was shown that only using of anode support with very high surface quality, substrate heating up to 500 °C and pulsed substrate bias (about -30 V MF) during film deposition is necessary for deposition of non-columnar thin films without voids and cracks that may be suitable for SOFC application. Режим доступа: по договору с организацией-держателем ресурса
Język:	angielski
Wydane:	2014
Hasła przedmiotowe:	электронный ресурс труды учёных ТПУ магнетронное распыление иттрий цирконий тонкие пленки
Dostęp online:	http://iopscience.iop.org/1742-6596/552/1/012010
Format:	Elektroniczne Rozdział
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=639135

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