Model of the coating growth under the conditions of magnetron sputtering deposition; Russian Physics Journal; Vol. 53, iss. 1
| Parent link: | Russian Physics Journal Vol. 53, iss. 1.— 2010.— [P. 83-89] |
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| Автор: | |
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| Резюме: | Title screen A mathematical model of a coating that grows during magnetron deposition is formulated and examined. The effect of the main technological and kinetic parameters on the coating growth dynamics is investigated. Режим доступа: по договору с организацией-держателем ресурса |
| Мова: | Англійська |
| Опубліковано: |
2010
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| Онлайн доступ: | http://link.springer.com/article/10.1007%2Fs11182-010-9391-4?LI=true |
| Формат: | MixedMaterials Електронний ресурс Частина з книги |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=637951 |