Химическое травление как метод постобработки 3D ячеистых структур, полученных электронно-лучевой наплавкой: ограничения и сложности
| Parent link: | Перспективы развития фундаментальных наук=Prospects of Fundamental Sciences Development: сборник научных трудов XVIII Международной конференции студентов, аспирантов и молодых ученых, г. Томск, 27-30 апреля 2021 г./ Национальный исследовательский Томский политехнический университет (ТПУ) ; под ред. И. А. Курзиной, Г. А. Вороновой.— , 2021 Т. 2 : Химия.— 2021.— [С. 193-195] |
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| Summary: | Заглавие с экрана Chemical etching is a promising method for post-surface treatment and the removal of residual powder from implants obtained using electron beam cladding. Partially sintered powder particles that remained on the implants surface can be difficult to remove from the internal structure of the additively manufactured specimens. In order to remove residual powder from scaffolds' interior, an aqueous solution of HF and HNO3 acids was used. Multiple immersion was more effective to remove the remaining powder, which was explained from the chemical point of view. The influence of the chemical etching on mechanical properties, mechanical behavior, fracture modes, and morphology was investigated. |
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2021
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| Online Access: | http://earchive.tpu.ru/handle/11683/68305 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=633350 |