Исследование пленок азотосодержащего оксида титана осажденных магнетронным распылением; Перспективы развития фундаментальных наук; Т. 1 : Физика
| Parent link: | Перспективы развития фундаментальных наук=Prospects of Fundamental Sciences Development: сборник научных трудов XVII Международной конференции студентов, аспирантов и молодых ученых, г. Томск, 21-24 апреля 2020 г./ Национальный исследовательский Томский политехнический университет (ТПУ) ; под ред. И. А. Курзиной, Г. А. Вороновой.— , 2020 Т. 1 : Физика.— 2020.— [С. 236-238] |
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| Autore principale: | |
| Enti autori: | , |
| Altri autori: | , |
| Riassunto: | Заглавие с экрана In the present paper we investigated nitrogen-doped titanium oxide thin films, deposited using magnetron sputtering with different regimes. The influence of reactive atmosphere and substrate bias on film deposition rate, refractive index, phase structure and topography has been analyzed. Regime with N[2]/O[2] ratio of 1-1 was characterized with maximum deposition rate. Addition of argon intro reactive atmosphere and substrate bias has led to the amorphous structure and flattened surface of TiO[x]N[y] films. |
| Lingua: | russo |
| Pubblicazione: |
2020
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| Soggetti: | |
| Accesso online: | http://earchive.tpu.ru/handle/11683/62569 |
| Natura: | Elettronico Capitolo di libro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=631543 |
| Riassunto: | Заглавие с экрана In the present paper we investigated nitrogen-doped titanium oxide thin films, deposited using magnetron sputtering with different regimes. The influence of reactive atmosphere and substrate bias on film deposition rate, refractive index, phase structure and topography has been analyzed. Regime with N[2]/O[2] ratio of 1-1 was characterized with maximum deposition rate. Addition of argon intro reactive atmosphere and substrate bias has led to the amorphous structure and flattened surface of TiO[x]N[y] films. |
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