Formation of the silicon coating on the NiTi substrate by magnetron sputteringi; Gas Discharge Plasmas and Their Applications (GDP 2019)

Formation of the silicon coating on the NiTi substrate by magnetron sputteringi; Gas Discharge Plasmas and Their Applications (GDP 2019)

Detalhes bibliográficos
Parent link:	Gas Discharge Plasmas and Their Applications (GDP 2019).— 2019.— [С. 190]
Autor principal:	Luchin A. V.
Autor Corporativo:	National Research Tomsk Polytechnic University
Outros Autores:	Krukovskii K. V., Kashin O. A.
Resumo:	Заглавие с титульного экрана
Idioma:	inglês
Publicado em:	2019
Assuntos:	электронный ресурс труды учёных ТПУ формирование покрытия подложки магнетронное распыление кремний
Acesso em linha:	http://earchive.tpu.ru/handle/11683/57739
Formato:	Recurso Eletrônico Capítulo de Livro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=630872

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