The nonisothermal model of the initial stage of ion implantation process

The nonisothermal model of the initial stage of ion implantation process

Bibliographic Details
Parent link:	Nanoparticles, nanostructured coatings and microcontainers: technology, properties, applications: 7th International Conference, May 12-15, 2016, Tomsk, Russia/ National Research Tomsk Polytechnic University (TPU). [P. 51].— , 2016
Main Author:	Parfenova E. S. Elena Sergeevna
Corporate Author:	Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Учебно-научная межотраслевая междисциплинарная лаборатория "Моделирование физико-химических процессов в современных технологиях" (УНММЛ "МФХПСТ")
Summary:	Title screen.
Language:	English
Published:	2016
Subjects:	электронный ресурс труды учёных ТПУ ионная имплантация обработка материалы поверхностные слои диффузия примесей механические напряжения компьютерное моделирование
Online Access:	http://www.lib.tpu.ru/fulltext/c/2016/002.pdf
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=624221

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