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The nonisothermal model of the initial stage of ion implantation process

The nonisothermal model of the initial stage of ion implantation process

Bibliographic Details
Parent link:Nanoparticles, nanostructured coatings and microcontainers: technology, properties, applications: 7th International Conference, May 12-15, 2016, Tomsk, Russia/ National Research Tomsk Polytechnic University (TPU). [P. 51].— , 2016
Main Author: Parfenova E. S. Elena Sergeevna
Corporate Author: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Учебно-научная межотраслевая междисциплинарная лаборатория "Моделирование физико-химических процессов в современных технологиях" (УНММЛ "МФХПСТ")
Summary:Title screen.
Published: 2016
Subjects:
электронный ресурс
труды учёных ТПУ
ионная имплантация
обработка
материалы
поверхностные слои
диффузия примесей
механические напряжения
компьютерное моделирование
Online Access:http://www.lib.tpu.ru/fulltext/c/2016/002.pdf
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=624221
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http://www.lib.tpu.ru/fulltext/c/2016/002.pdf

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