Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching; Energy Fluxes and Radiation Effects (EFRE-2016)

Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching; Energy Fluxes and Radiation Effects (EFRE-2016)

Detalles Bibliográficos
Parent link:	Energy Fluxes and Radiation Effects (EFRE-2016).— 2016.— [P. 351]
Autor Principal:	Okhotnikov V. V. Vitaly Vladimirovich
Autor Corporativo:	Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Лаборатория № 1
Outros autores:	Linnik S. A. Stepan Andreevich, Gaydaychuk A. V. Alexander Valerievich
Summary:	Title screen
Idioma:	inglés
Publicado:	2016
Subjects:	труды учёных ТПУ электронный ресурс осаждение алмазы фотолитография ионное травление CVD diamond catings glow discharge plasma selective deposition structure
Acceso en liña:	http://earchive.tpu.ru/handle/11683/35867
Formato:	Electrónico Capítulo de libro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=621409

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