Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching

Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching

Dettagli Bibliografici
Parent link:	Energy Fluxes and Radiation Effects (EFRE-2016): International Congress, October 2–7, 2016, Tomsk, Russia/ National Research Tomsk Polytechnic University (TPU) ; eds. B. M. Kovalchuk [et al.]. [P. 351].— , 2016
Autore principale:	Okhotnikov V. V. Vitaly Vladimirovich
Ente Autore:	Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Лаборатория № 1
Altri autori:	Linnik S. A. Stepan Andreevich, Gaydaychuk A. V. Alexander Valerievich
Riassunto:	Title screen
Lingua:	inglese
Pubblicazione:	2016
Soggetti:	труды учёных ТПУ электронный ресурс осаждение алмазы фотолитография ионное травление CVD diamond catings glow discharge plasma selective deposition structure
Accesso online:	http://earchive.tpu.ru/handle/11683/35867
Natura:	Elettronico Capitolo di libro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=621409

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