Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching; Energy Fluxes and Radiation Effects (EFRE-2016)

Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching; Energy Fluxes and Radiation Effects (EFRE-2016)

Bibliografiset tiedot
Parent link:	Energy Fluxes and Radiation Effects (EFRE-2016).— 2016.— [P. 351]
Päätekijä:	Okhotnikov V. V. Vitaly Vladimirovich
Yhteisötekijä:	Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Лаборатория № 1
Muut tekijät:	Linnik S. A. Stepan Andreevich, Gaydaychuk A. V. Alexander Valerievich
Yhteenveto:	Title screen
Kieli:	englanti
Julkaistu:	2016
Aiheet:	труды учёных ТПУ электронный ресурс осаждение алмазы фотолитография ионное травление CVD diamond catings glow discharge plasma selective deposition structure
Linkit:	http://earchive.tpu.ru/handle/11683/35867
Aineistotyyppi:	Elektroninen Kirjan osa
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=621409

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