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621409 |
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20231226111626.0 |
| 035 |
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|a (RuTPU)RU\TPU\conf\19990
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| 035 |
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|a RU\TPU\conf\19989
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|a 621409
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| 100 |
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|a 20161220d2016 k y0engy50 ba
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| 101 |
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|a eng
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|a RU
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|a y z 101zy
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| 135 |
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|a drgn ---uucaa
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| 181 |
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|a i
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| 182 |
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|a b
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| 200 |
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|a Highly selective deposition of CVD diamond on si wafers by using a combined technique of photolithography and ion etching
|f V. V. Okhotnikov, S. A. Linnik, A. V. Gaydaychuk
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| 203 |
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|a Текст
|c электронный
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| 300 |
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|a Title screen
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| 463 |
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|0 (RuTPU)RU\TPU\conf\19513
|t Energy Fluxes and Radiation Effects (EFRE-2016)
|o International Congress, October 2–7, 2016, Tomsk, Russia
|o abstracts
|f National Research Tomsk Polytechnic University (TPU) ; eds. B. M. Kovalchuk [et al.]
|v [P. 351]
|d 2016
|
| 610 |
1 |
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|a труды учёных ТПУ
|
| 610 |
1 |
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|a электронный ресурс
|
| 610 |
1 |
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|a осаждение
|
| 610 |
1 |
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|a алмазы
|
| 610 |
1 |
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|a фотолитография
|
| 610 |
1 |
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|a ионное травление
|
| 610 |
1 |
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|a CVD diamond catings
|
| 610 |
1 |
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|a glow discharge plasma
|
| 610 |
1 |
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|a selective deposition
|
| 610 |
1 |
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|a structure
|
| 700 |
|
1 |
|a Okhotnikov
|b V. V.
|c physicist
|c engineer of Tomsk Polytechnic University
|f 1992-
|g Vitaly Vladimirovich
|3 (RuTPU)RU\TPU\pers\36453
|
| 701 |
|
1 |
|a Linnik
|b S. A.
|c physicist
|c Engineer-Researcher of Tomsk Polytechnic University
|f 1985-
|g Stepan Andreevich
|3 (RuTPU)RU\TPU\pers\32877
|9 16725
|
| 701 |
|
1 |
|a Gaydaychuk
|b A. V.
|c physicist
|c Postgraduate, Engineer - Researcher of Tomsk Polytechnic University
|f 1984-
|g Alexander Valerievich
|3 (RuTPU)RU\TPU\pers\32876
|9 16724
|
| 712 |
0 |
2 |
|a Национальный исследовательский Томский политехнический университет (ТПУ)
|b Институт физики высоких технологий (ИФВТ)
|b Лаборатория № 1
|3 (RuTPU)RU\TPU\col\19035
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| 801 |
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2 |
|a RU
|b 63413507
|c 20161230
|g RCR
|
| 856 |
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|u http://earchive.tpu.ru/handle/11683/35867
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| 942 |
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|c BK
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