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Characterzations of nitrogen-doped titanium dioxide films prepared by reactive magnetron sputtering deposition

Characterzations of nitrogen-doped titanium dioxide films prepared by reactive magnetron sputtering deposition

Bibliographic Details
Parent link:Energy Fluxes and Radiation Effects (EFRE-2016): International Congress, October 2–7, 2016, Tomsk, Russia/ National Research Tomsk Polytechnic University (TPU) ; eds. B. M. Kovalchuk [et al.]. [P. 321].— , 2016
Main Author: Pichugin V. F. Vladimir Fyodorovich
Corporate Author: Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра экспериментальной физики (ЭФ)
Other Authors: Pustovalova A. A. Alla Aleksandrovna
Summary:Title screen
Published: 2016
Subjects:
труды учёных ТПУ
электронный ресурс
легирование
азот
пленки
диоксид титана
осаждение
реактивное распыление
магнетронное распыление
магнетроны
magnetron
sputtering
TiON films
Online Access:http://earchive.tpu.ru/handle/11683/35857
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=621400
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http://earchive.tpu.ru/handle/11683/35857

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