Распределение элементов в покрытиях нитрида титана, полученных вакуумно-дуговым осаждением с различным потенциалом смещения; Перспективы развития фундаментальных наук
| Parent link: | Перспективы развития фундаментальных наук.— 2015.— [С. 302-304] |
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| প্রধান লেখক: | |
| সংস্থা লেখক: | |
| অন্যান্য লেখক: | |
| সংক্ষিপ্ত: | Заглавие с экрана This paper is devoted to investigation of element distribution and microparticles formation during deposition of titanium nitride coatings by cathodic vacuum arc with pulsed bias voltage. The results revealed that with the increase in bias voltage from -100 to -300 V, Ti/N ratio and the quantity and size of microparticles decreased. Meanwhile, the uniform distribution of elements in TiN coatings was observed. |
| ভাষা: | রুশ |
| প্রকাশিত: |
2015
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| মালা: | Физика |
| বিষয়গুলি: | |
| অনলাইন ব্যবহার করুন: | http://earchive.tpu.ru/handle/11683/19170 http://www.lib.tpu.ru/fulltext/c/2015/C21/090.pdf |
| বিন্যাস: | বৈদ্যুতিক গ্রন্থের অধ্যায় |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=613001 |
| দৈহিক বর্ননা: | 1 файл(239 Кб) |
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| সংক্ষিপ্ত: | Заглавие с экрана This paper is devoted to investigation of element distribution and microparticles formation during deposition of titanium nitride coatings by cathodic vacuum arc with pulsed bias voltage. The results revealed that with the increase in bias voltage from -100 to -300 V, Ti/N ratio and the quantity and size of microparticles decreased. Meanwhile, the uniform distribution of elements in TiN coatings was observed. |