Распределение элементов в покрытиях нитрида титана, полученных вакуумно-дуговым осаждением с различным потенциалом смещения
| Parent link: | Перспективы развития фундаментальных наук.— 2015.— [С. 302-304] |
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| Summary: | Заглавие с экрана This paper is devoted to investigation of element distribution and microparticles formation during deposition of titanium nitride coatings by cathodic vacuum arc with pulsed bias voltage. The results revealed that with the increase in bias voltage from -100 to -300 V, Ti/N ratio and the quantity and size of microparticles decreased. Meanwhile, the uniform distribution of elements in TiN coatings was observed. |
| Language: | Russian |
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2015
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| Series: | Физика |
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| Online Access: | http://earchive.tpu.ru/handle/11683/19170 http://www.lib.tpu.ru/fulltext/c/2015/C21/090.pdf |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=613001 |
| Physical Description: | 1 файл(239 Кб) |
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| Summary: | Заглавие с экрана This paper is devoted to investigation of element distribution and microparticles formation during deposition of titanium nitride coatings by cathodic vacuum arc with pulsed bias voltage. The results revealed that with the increase in bias voltage from -100 to -300 V, Ti/N ratio and the quantity and size of microparticles decreased. Meanwhile, the uniform distribution of elements in TiN coatings was observed. |