Влияние примеси никеля на скорость поверхностной генерации на границе раздела Si-SiO[2]; Известия вузов. Физика; Т. 46, № 2

Влияние примеси никеля на скорость поверхностной генерации на границе раздела Si-SiO[2]; Известия вузов. Физика; Т. 46, № 2

Bibliographic Details
Parent link:	Известия вузов. Физика/ Министерство общего и профессионального образования Российской Федерации ; Томский Госуниверситет.— , 1958-.— 0021-3411 Т. 46, № 2.— 2003.— с. 50-53
Main Author:	Зайнабидинов С. З.
Other Authors:	Йулчиев Ш. Х.
Language:	Russian
Published:	2003
Series:	Физика полупроводников и диэлектриков
Subjects:	никель примеси поверхностная генерация скорость изотермическая релаксация границы раздела Si-SiO[2] легирование
Format:	Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=419802

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