A Plasma System for Low-Emissive Coating Deposition

A Plasma System for Low-Emissive Coating Deposition

Bibliographic Details
Parent link:7 International conference on modification of materials with particle beams and plasma flows: Tomsk, Russia, 25-29 July 2004/ edited by S. Korovin, A. Ryabchikov. [P. 440-442].— , 2004
Other Authors: Ananyin P. S., Asainov O. Kh. Oleg Khaydarovich, Bainov D. D. Dashi Dambaevich, Bleykher (Bleicher) G. A. Galina Alekseevna, Zhukov V. V., Zorkalcev A. A., Krivobokov V. P. Valery Pavlovich, Kosicin L. G., Legostayev V. N., Merkulov S. V., Mikhailov M. N., Nechaev M. A., Noskova T. G., Paschenko O. V., Puzyrevich A. G., Umnov S. P. Sergey Pavlovich, Yudakov S. V., Yanin S. N. Sergey Nikolaevich
Summary:Title from the title-page.
Plasma Systems "Opal" were worked out by us for deposition of thin films with various composition on the surface of sheet glass, plastic and other materials. The deposition of films is fulfilled with assistance of magnetron discharge plasma. The system "Opal-3" is presented in the paper. Its basic working elements and a technological regime for deposition of heat-reflecting (low-emissive) coating on a basis of Ag are described.
Режим доступа: из корпоративной сети ТПУ
Text files
Published: 2004
Series:Coating deposition
Subjects:
физика
плазменные системы
Opal
тонкие пленки
теплоотражающие покрытия
осаждение
поверхности
магнетронные разряды
труды учёных ТПУ
электронный ресурс
Online Access:http://www.lib.tpu.ru/fulltext2/c/2004/C13/049.pdf
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=232127

Internet

http://www.lib.tpu.ru/fulltext2/c/2004/C13/049.pdf

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