Technological features of the dual magnetron sputtering system for reactive deposition of thin film coatings

Technological features of the dual magnetron sputtering system for reactive deposition of thin film coatings

Bibliographic Details
Parent link:	Modern technique and technologies MTT' 2012.— 2012.— [С. 181-182]
Main Author:	Sidelev D. V. Dmitry Vladimirovich
Corporate Author:	National Research Tomsk Polytechnic University
Other Authors:	Yurjev Y. N. (727)
Summary:	Заглавие с титульного листа
Language:	English
Published:	2012
Series:	Section VIII: Modern Physical Methods in Science, Engineering and Medicine
Subjects:	труды учёных ТПУ электронный ресурс
Online Access:	http://www.lib.tpu.ru/fulltext/v/Conferences/2012/C2/ENG/eng_084.pdf
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=227964

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