Resultats de la cerca - Yuryeva A. V. Alena Victorovna

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  1. 1
    The energy flux onto substrate during coating deposition using magnetron with liquid metal target

    The energy flux onto substrate during coating deposition using magnetron with liquid metal target per Bleykher (Bleicher) G. A. Galina Alekseevna

    Publicat 2016
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  2. 2
    Erosion yield of metal surface under ion pulsed irradiation

    Erosion yield of metal surface under ion pulsed irradiation per Krivobokov V. P. Valery Pavlovich

    Publicat 2013
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  3. 3
    Thermal processes and emission of atoms from the liquid phase target surface of a magnetron sputtering system

    Thermal processes and emission of atoms from the liquid phase target surface of a magnetron sputtering system per Bleykher (Bleicher) G. A. Galina Alekseevna

    Publicat 2015
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  4. 4
    Magnetron deposition of coatings with evaporation of the target

    Magnetron deposition of coatings with evaporation of the target per Bleykher (Bleicher) G. A. Galina Alekseevna

    Publicat 2015
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  5. 5
    Energy and substance transfer in magnetron sputtering systems with liquid-phase target

    Energy and substance transfer in magnetron sputtering systems with liquid-phase target

    Publicat 2016
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  6. 6
    Metal Coatings Deposition Using Hot Target Magnetrons

    Metal Coatings Deposition Using Hot Target Magnetrons

    Publicat 2019
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  7. 7
    Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target

    Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target

    Publicat 2017
    Altres autors: “…Yuryeva A. V. Alena Victorovna…”
    Obtenir text complet
    Electrònic Capítol de llibre
  8. 8
    Features of self-sustained magnetron sputtering of evaporating metal target

    Features of self-sustained magnetron sputtering of evaporating metal target

    Publicat 2019
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  9. 9
    High-voltage MIS-gated GaN transistors

    High-voltage MIS-gated GaN transistors

    Publicat 2017
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  10. 10
    The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering

    The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering

    Publicat 2018
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  11. 11
    Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets

    Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets

    Publicat 2019
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  12. 12
    Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets

    Peculiarities of metal coatings deposition using magnetron sputtering systems with hot and evaporative targets

    Publicat 2018
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  13. 13
    Study on Optical and Photocatalytic Properties of Titanium Oxide Thin Films with Various Oxidation Degrees

    Study on Optical and Photocatalytic Properties of Titanium Oxide Thin Films with Various Oxidation Degrees

    Publicat 2022
    Altres autors: Obtenir text complet
    Статья на русском языке
    Electrònic Capítol de llibre
  14. 14
    Aluminum films deposition by magnetron sputtering systems:Influence of target state and pulsing unit

    Aluminum films deposition by magnetron sputtering systems:Influence of target state and pulsing unit

    Publicat 2016
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  15. 15
    Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit

    Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit

    Publicat 2016
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  16. 16
    The properties of Cu films deposited by high rate magnetron sputtering from a liquid target

    The properties of Cu films deposited by high rate magnetron sputtering from a liquid target

    Publicat 2019
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre
  17. 17
    Features of copper coatings growth at high-rate deposition using magnetron sputtering systems with a liquid metal target

    Features of copper coatings growth at high-rate deposition using magnetron sputtering systems with a liquid metal target

    Publicat 2017
    Altres autors: Obtenir text complet
    Electrònic Capítol de llibre

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