Rezultati - Grenadyorov A. S.

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  1. 1
    Properties of low-e coatings on a polymer film with structure TiO2/ZnO:Ga/Ag/ZnO:Ga/TiO2 and TiO2/Cu/TiO2

    Properties of low-e coatings on a polymer film with structure TiO2/ZnO:Ga/Ag/ZnO:Ga/TiO2 and TiO2/Cu/TiO2 od Grenadyorov A. S.

    Izdano 2012
    Polni tekst
    Elektronski Book Chapter
  2. 2
    Effect of deposition conditions on optical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method

    Effect of deposition conditions on optical properties of a-C:H:SiOx films prepared by plasma-assisted chemical vapor deposition method od Grenadyorov A. S. Aleksandr Sergeevich

    Izdano 2018
    Polni tekst
    Elektronski Book Chapter
  3. 3
    Mechanical and tribological characteristics of a-C:H:SiOx films formed by PACVD on titanium alloy VT1-0

    Mechanical and tribological characteristics of a-C:H:SiOx films formed by PACVD on titanium alloy VT1-0

    Izdano 2019
    Drugi avtorji: “...Grenadyorov A. S....”
    Polni tekst
    Polni tekst
    Elektronski Book Chapter
  4. 4
    The Deposition of Silicon-Carbon Coatings in Plasma Based Nonself-Sustained Arc Discharge with Heated Cathode

    The Deposition of Silicon-Carbon Coatings in Plasma Based Nonself-Sustained Arc Discharge with Heated Cathode

    Izdano 2016
    Drugi avtorji: “...Grenadyorov A. S....”
    Polni tekst
    Elektronski Book Chapter
  5. 5
    Deposition of silicon–carbon coatings from the plasma of a non-self-sustained arc discharge with a heated cathode

    Deposition of silicon–carbon coatings from the plasma of a non-self-sustained arc discharge with a heated cathode

    Izdano 2016
    Drugi avtorji: “...Grenadyorov A. S. Aleksandr Sergeevich...”
    Polni tekst
    Elektronski Book Chapter
  6. 6
    Preparation of nickel-containing conductive amorphous carbon films by magnetron sputtering with negative high-voltage pulsed substrate bias

    Preparation of nickel-containing conductive amorphous carbon films by magnetron sputtering with negative high-voltage pulsed substrate bias

    Izdano 2018
    Drugi avtorji: Polni tekst
    Elektronski Book Chapter
  7. 7
    Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating

    Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating

    Izdano 2023
    Drugi avtorji: “...Grenadyorov A. S. Aleksandr Sergeevich...”
    Polni tekst
    Elektronski Book Chapter
  8. 8
    Kinetics of plasma-assisted chemical vapor deposition combined with inductively excited RF discharge and properties of a-C:H:SiOx coatings

    Kinetics of plasma-assisted chemical vapor deposition combined with inductively excited RF discharge and properties of a-C:H:SiOx coatings

    Izdano 2022
    Drugi avtorji: “...Grenadyorov A. S. Aleksandr Sergeevich...”
    Polni tekst
    Elektronski Book Chapter
  9. 9
    Enhancement of the adhesive strength of antithrombogenic and hemocompatible a-C:H:SiOx films to polypropylene

    Enhancement of the adhesive strength of antithrombogenic and hemocompatible a-C:H:SiOx films to polypropylene

    Izdano 2020
    Drugi avtorji: “...Grenadyorov A. S. Aleksandr Sergeevich...”
    Polni tekst
    Elektronski Book Chapter

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