Canlyniadau Chwilio

Filtered Vacuum Arc Plasma Application For Ion-Beam and Plasma Material Processing

Investigation of Negative Bias Pulse Parameters Influence to Macroparticles Accumulation on Substrate Immersed in Titanium Vacuum Arc Plasma

Joint Influence of Steered Vacuum Arc and Negative Repetitively Pulsed Bias on Macroparticles Suppression

Tangential Cathode Magnetic Field and Substrate Bias Influence on Copper Vacuum Arc Macroparticle Content Decreasing

Исследование влияния отрицательного смещения подложки на параметры плазмы ВЧ-магнетронного распыления методом двойного зонда Ленгмюра... gan Мухаметкалиев Т. М. Тимур Мухамедрашидович

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Influence of Repetitively Pulsed Negative Bias Parameters on Macroparticle Surface Density

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