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    Filtered Vacuum Arc Plasma Application For Ion-Beam and Plasma Material Processing

    Udgivet 2015
    Book Chapter
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    Tangential Cathode Magnetic Field and Substrate Bias Influence on Copper Vacuum Arc Macroparticle Content Decreasing

    Udgivet 2015
    Book Chapter
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    Tangential cathode magnetic field and substrate bias influence on copper vacuum arc macroparticle content decreasing

    Udgivet 2016
    Få fuldtekst
    Electronisk Book Chapter
  12. 12

    Influence of Repetitively Pulsed Negative Bias Parameters on Macroparticle Surface Density

    Udgivet 2016
    Få fuldtekst
    Electronisk Book Chapter
  13. 13

    Joint influence of steered vacuum arc and negative repetitively pulsed bias on titanium macroparticles suppression

    Udgivet 2018
    Få fuldtekst
    Electronisk Book Chapter
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