High-Temperature Oxidation of Laminated Ta/Ti3Al(Si)C2 Composites in the Temperature Range 800–1300°C; Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques; Vol. 19, iss. 5

Bibliografische gegevens
Parent link:Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques.— .— Road Town: Pleiades Publishing, Ltd.
Vol. 19, iss. 5.— 2025.— P. 1231–1238
Andere auteurs: Kashkarov E. B. Egor Borisovich, Pushilina N. S. Natalia Sergeevna, Abdulmenova A. V. Anastasiya Vladimirovna, Sedanova E. P. Elizaveta Pavlovna, Gusev K. S. Kirill Sergeevich, Syrtanov M. S. Maksim Sergeevich
Samenvatting:Title screen
The paper presents the results of a study of high-temperature oxidation in air of the metal-ceramic layered Ti3Al(Si)C2/Ta composites. The composites were made of preceramic papers filled with Ti3Al(Si)C2 and metal foils (Ta) by spark plasma sintering. The sintering temperature was 1250°C, the holding time was 5 min, and the pressure was 50 MPa. The corrosion resistance of the laminated Ti3Al(Si)C2/Ta composites was estimated based on the results of high-temperature oxidation in air. The phase composition and microstructure of the oxide layers were analyzed by X-ray diffraction and scanning electron microscopy, respectively. It has been found that the Ti3Al(Si)C2/Ta composites demonstrate high oxidation resistance in the temperature range 800–1200°C due to the formation of a dense Al2O3 layer on the outer surface of Ti3Al(Si)C2. With an increase in the oxidation temperature to 1300°C, a complex oxide layer is formed, consisting of an outer TiO2/SiO2/Al2TiO5 layer and an inner TiO2/Al2O3 oxide layer. The thickness of the TiO2/Al2O3 oxide layers formed on the surface of the Ti3Al(Si)C2/Ta composite at oxidation temperatures up to 900°C is less than 1 μm, at a temperature of 1200°C the thickness of the oxide layers is 3.5 μm, and at 1300°C it is 56 μm
Текстовый файл
AM_Agreement
Taal:Engels
Gepubliceerd in: 2025
Onderwerpen:
Online toegang:https://doi.org/10.1134/S1027451025701769
Formaat: Elektronisch Hoofdstuk
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=687390

MARC

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200 1 |a High-Temperature Oxidation of Laminated Ta/Ti3Al(Si)C2 Composites in the Temperature Range 800–1300°C  |f E. B. Kashkarov, N. S. Pushilina, A. V. Abdulmenova [et al.] 
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330 |a The paper presents the results of a study of high-temperature oxidation in air of the metal-ceramic layered Ti3Al(Si)C2/Ta composites. The composites were made of preceramic papers filled with Ti3Al(Si)C2 and metal foils (Ta) by spark plasma sintering. The sintering temperature was 1250°C, the holding time was 5 min, and the pressure was 50 MPa. The corrosion resistance of the laminated Ti3Al(Si)C2/Ta composites was estimated based on the results of high-temperature oxidation in air. The phase composition and microstructure of the oxide layers were analyzed by X-ray diffraction and scanning electron microscopy, respectively. It has been found that the Ti3Al(Si)C2/Ta composites demonstrate high oxidation resistance in the temperature range 800–1200°C due to the formation of a dense Al2O3 layer on the outer surface of Ti3Al(Si)C2. With an increase in the oxidation temperature to 1300°C, a complex oxide layer is formed, consisting of an outer TiO2/SiO2/Al2TiO5 layer and an inner TiO2/Al2O3 oxide layer. The thickness of the TiO2/Al2O3 oxide layers formed on the surface of the Ti3Al(Si)C2/Ta composite at oxidation temperatures up to 900°C is less than 1 μm, at a temperature of 1200°C the thickness of the oxide layers is 3.5 μm, and at 1300°C it is 56 μm 
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461 1 |t Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques  |c Road Town  |n Pleiades Publishing, Ltd. 
463 1 |t Vol. 19, iss. 5  |v P. 1231–1238  |d 2025 
610 1 |a high-temperature oxidation 
610 1 |a composites 
610 1 |a MAX phases 
610 1 |a Ti3Al(Si)C2 
610 1 |a spark plasma sintering 
610 1 |a microstructure 
610 1 |a preceramic paper 
610 1 |a laminates 
610 1 |a layered structures 
610 1 |a tantalum 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
701 1 |a Kashkarov  |b E. B.  |c Physicist  |c Associate Professor, Researcher of Tomsk Polytechnic University, Candidate of Physical and Mathematical Sciences  |f 1991-  |g Egor Borisovich  |9 18267 
701 1 |a Pushilina  |b N. S.  |c physicist  |c associate Professor of Tomsk Polytechnic University, candidate of physico-mathematical Sciences  |f 1984-  |g Natalia Sergeevna  |9 15085 
701 1 |a Abdulmenova  |b A. V.  |c physicist  |c engineer at Tomsk Polytechnic University  |f 2001-  |g Anastasiya Vladimirovna  |9 88516 
701 1 |a Sedanova  |b E. P.  |c Specialist in the field of nuclear technologies  |c Engineer of Tomsk Polytechnic University  |f 1994-  |g Elizaveta Pavlovna  |9 21923 
701 1 |a Gusev  |b K. S.  |c physicist  |c Technician of Tomsk Polytechnic University  |f 2001-  |g Kirill Sergeevich  |9 23019 
701 1 |a Syrtanov  |b M. S.  |c physicist  |c Associate Professor, Researcher of Tomsk Polytechnic University, Candidate of Technical Sciences  |f 1990-  |g Maksim Sergeevich  |9 18114 
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