Writing, rewriting, and directing matter on a graphene canvas; Carbon; Vol. 249
| Parent link: | Carbon.— .— Amsterdam: Elsevier Science Publishing Company Inc. Vol. 249.— 2026.— Article number 121215, 10 p. |
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| Other Authors: | , , , , , , , , , , , |
| Summary: | Title screen Conventional fabrication of integrated carbon electronics often requires material deposition or transfer, which inevitably leads to surface contamination and structural defects. Here, we present a monolithic “Write-Rewrite-Direct” approach for in situ sequential programming of carbon's optical, electrical, and chemical properties from a single parent graphite crystal, overcoming the challenges of material transfer. First, we introduce Catalyst-Enhanced Electrochemical Lithography (CEEL), an acid-free route that exploits MoS2 electrocatalysis to "write" atomically smooth epitaxy-like graphene oxide (GO) directly onto graphite. In contrast to conventional electrochemical oxidation of graphite, which yields rough surfaces, CEEL produces mechanically robust, vivid photonic structures with intense structural colors. We validate this monolithic integration by fabricating the first all-carbon field-effect transistor with a vertical gate-dielectric-channel configuration, without any lithographic patterning of contacts or lift-off processes. Second, we "rewrite" these films with a tightly focused laser to produce laser-reduced graphene oxide (LrGO) vertical interconnects. This enables us to draw all-carbon free-form, high-resolution LrGO circuits within the larger, electrochemically defined GO structure. Finally, we exploit this hierarchical control to "direct" the selective assembly of plasmonic nanostructures onto the LrGO patterns, integrating plasmonic microreactors and chemical sensing capabilities. This "Write-Rewrite-Direct" paradigm is a potential enabler of next-generation all-carbon electronics, offering a maskless route to creating dynamic, reconfigurable surfaces, including field-effect transistors and advanced sensing and photocatalytic platforms monolithically integrated in a single device Текстовый файл AM_Agreement |
| Language: | English |
| Published: |
2026
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| Subjects: | |
| Online Access: | https://doi.org/10.1016/j.carbon.2025.121215 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=687115 |
| Summary: | Title screen Conventional fabrication of integrated carbon electronics often requires material deposition or transfer, which inevitably leads to surface contamination and structural defects. Here, we present a monolithic “Write-Rewrite-Direct” approach for in situ sequential programming of carbon's optical, electrical, and chemical properties from a single parent graphite crystal, overcoming the challenges of material transfer. First, we introduce Catalyst-Enhanced Electrochemical Lithography (CEEL), an acid-free route that exploits MoS2 electrocatalysis to "write" atomically smooth epitaxy-like graphene oxide (GO) directly onto graphite. In contrast to conventional electrochemical oxidation of graphite, which yields rough surfaces, CEEL produces mechanically robust, vivid photonic structures with intense structural colors. We validate this monolithic integration by fabricating the first all-carbon field-effect transistor with a vertical gate-dielectric-channel configuration, without any lithographic patterning of contacts or lift-off processes. Second, we "rewrite" these films with a tightly focused laser to produce laser-reduced graphene oxide (LrGO) vertical interconnects. This enables us to draw all-carbon free-form, high-resolution LrGO circuits within the larger, electrochemically defined GO structure. Finally, we exploit this hierarchical control to "direct" the selective assembly of plasmonic nanostructures onto the LrGO patterns, integrating plasmonic microreactors and chemical sensing capabilities. This "Write-Rewrite-Direct" paradigm is a potential enabler of next-generation all-carbon electronics, offering a maskless route to creating dynamic, reconfigurable surfaces, including field-effect transistors and advanced sensing and photocatalytic platforms monolithically integrated in a single device Текстовый файл AM_Agreement |
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| DOI: | 10.1016/j.carbon.2025.121215 |