Magnetron sputtering of hot silicon carbide target; Surface and Coatings Technology; Vol. 528

Magnetron sputtering of hot silicon carbide target; Surface and Coatings Technology; Vol. 528

מידע ביבליוגרפי
Parent link:Surface and Coatings Technology.— .— Amsterdam: Elsevier Science Publishing Company Inc.
Vol. 528.— 2026.— Article number 133455, 9 p.
מחברים אחרים: Grudinin V. A. Vladislav Alekseevich, Fisher M. E. Maria Eduardovna, Bleykher (Bleicher) G. A. Galina Alekseevna, Ashikhmin D. A. Denis Aleksandrovich, Rodriguez (Rodriges) Contreras R. D. Raul David, Sidelev D. V. Dmitry Vladimirovich
סיכום:Title screen
This work presents a systematic investigation of silicon carbide (SiC) thin film deposition by magnetron sputtering using cooled and thermally insulated (“hot”) target configurations. Optical emission spectroscopy revealed that hot target operation induces additional Si* and C* emission lines and nonlinear intensity growth, indicating enhanced fluxes of sputtered and sublimated species at power densities above 40 W/cm2. Thermal modeling validated by magnetic field measurements showed that at the maximum applied power density of 62.9 W/cm2, the target surface reaches 1701 K with pronounced thermal gradients, promoting partial sublimation. Under these conditions, deposition rates of 205 ± 10 nm/min (12.3 ± 0.6 μm/h) were achieved – an order of magnitude higher than typical sputtering techniques. Structural analysis demonstrated that coatings deposited without substrate bias remain X-ray amorphous due to low substrate temperatures (∼492 K), consistent with zone T in the structure zone model. Application of a − 100 V substrate bias promoted the formation of nanocrystalline hexagonal SiC (grain size <10 nm) and nearly stoichiometric Si:C ≈ 1:1 composition, as confirmed by XRD and Raman spectroscopy. These results establish hot target magnetron sputtering as an effective route for scalable high rate SiC coating growth
Текстовый файл
AM_Agreement
שפה:אנגלית
יצא לאור: 2026
נושאים:
электронный ресурс
труды учёных ТПУ
SiC coatings
Hot target
Magnetron sputtering
High-rate deposition
גישה מקוונת:https://doi.org/10.1016/j.surfcoat.2026.133455
פורמט: אלקטרוני Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=686090

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