Magnetron Deposition of Oxide Films in the Metallic Mode Enhanced by Radio-Frequency Inductively Coupled Plasma Source

Magnetron Deposition of Oxide Films in the Metallic Mode Enhanced by Radio-Frequency Inductively Coupled Plasma Source

Bibliographic Details
Parent link:	Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques.— .— New York: Springer Science+Business Media LLC. Vol. 17, iss. 5.— 2023.— P. 1143-1147
Main Author:	Sidelev D. V. Dmitry Vladimirovich
Other Authors:	Voronina E. D. Ekaterina Dmitrievna
Summary:	Title screen Magnetron sputtering of an yttrium target in a reactive atmosphere of Ar + O2 enhanced by a radio-frequency inductively coupled plasma source was studied. Four different schemes for yttrium target sputtering were examined to define the possibility to use the metallic deposition mode for a coating consisting of the yttrium oxide phase. The effective pumping speeds were calculated for all experimental schemes. The increase in the effective pumping speed from 0.24 to ~0.87 m3/s when using dual magnetron sputtering of Y and Cu targets was shown to result in the shift of the hysteresis loop towards higher O2 flow rates. This leads to the use of both transition and metallic modes of Y target sputtering in the Ar + O2 atmosphere. The oxide coating was deposited by dual magnetron sputtering of yttrium and copper targets in the metallic mode, enhanced by a radio-frequency inductively coupled plasma source. The coating consisted of Cu2O and Y2O3 phases. The calculation of Cu and Y sputtering yields was done to confirm the metallic mode of coating deposition Текстовый файл AM_Agreement
Published:	2023
Subjects:	reactive deposition magnetron sputtering oxide coating deposition thin films metallic mode radio-frequency inductively coupled plasma (RF-ICP) deposition rate yttrium oxide plasma assistance электронный ресурс труды учёных ТПУ
Online Access:	https://doi.org/10.1134/S1027451023050166
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=683407

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