Modification of optical and photoelectrical properties of thin gallium oxide films by intense pulsed 200 keV C+ ion beams

Bibliografiska uppgifter
Parent link:Optical Materials: X.— .— Amsterdam: Elsevier Science Publishing Company Inc.
Vol. 25.— 2025.— Article number 100399, 8 p.
Övriga upphovsmän: Koishybayeva Zh. Zhanymgul, Konusov F. V. Fedor Valerievich, Pavlov S. K. Sergey Konstantinovich, Sidelev D. V. Dmitry Vladimirovich, Nassyrbayev (Nasyrbaev) A. Artur, Gadirov R. M. Ruslan Mukhamedzhanovich, Tarbokov V. A. Vladislav Aleksandrovich, Polisadova E. F. Elena Fyodorovna, Akilbekov A. T. Abdirash Tasanovich
Sammanfattning:Title screen
In this work the effect of an intense pulsed ion irradiation with a high flux ∼1020 cm−2s−1 on structure, optical and photo-electrical properties of gallium oxide thin films have been investigated. The films were produced by the radio-frequency magnetron sputtering method and had amorphous structure. A part of deposited films was annealed in the air environment (900 °C, 1 h) for synthesis of β-Ga2O3 phase. Obtained films were subjected to the intense pulsed ion irradiation (ion energy - up to 200 keV, pulse duration - 100 ns, current density on the target - up to 30 A/cm2, number of pulses - 3). The influence of irradiation on optical absorption and photoluminescence spectra, field and temperature dependencies of dark and photoconductivity were investigated. The probable nature of growth defects is discussed, and a scheme of electronic transitions that determine optical properties is proposed
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Språk:engelska
Publicerad: 2025
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Länkar:https://doi.org/10.1016/j.omx.2025.100399
Materialtyp: Elektronisk Bokavsnitt
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=681877
Beskrivning
Sammanfattning:Title screen
In this work the effect of an intense pulsed ion irradiation with a high flux ∼1020 cm−2s−1 on structure, optical and photo-electrical properties of gallium oxide thin films have been investigated. The films were produced by the radio-frequency magnetron sputtering method and had amorphous structure. A part of deposited films was annealed in the air environment (900 °C, 1 h) for synthesis of β-Ga2O3 phase. Obtained films were subjected to the intense pulsed ion irradiation (ion energy - up to 200 keV, pulse duration - 100 ns, current density on the target - up to 30 A/cm2, number of pulses - 3). The influence of irradiation on optical absorption and photoluminescence spectra, field and temperature dependencies of dark and photoconductivity were investigated. The probable nature of growth defects is discussed, and a scheme of electronic transitions that determine optical properties is proposed
Текстовый файл
AM_Agreement
DOI:10.1016/j.omx.2025.100399