Effect of Irradiation with a Pulsed Electron Beam on Chromium Diffusion in the Zr–1 wt % Nb Alloy
| Parent link: | Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques.— .— New York: Springer Science+Business Media LLC Vol. 18, iss. 6.— 2024.— P. 1443-1450 |
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| Andere auteurs: | , , , |
| Samenvatting: | Title screen The diffusion of chromium from the surface was studied in a polycrystalline Zr–1 wt % Nb alloy under conditions of isothermal diffusion annealing and irradiation with a pulsed electron beam in the temperature range of (0.3–0.4) of the zirconium melting temperature using the high-frequency glow discharge optical emission spectrometry methods. It has been established that the deposition of a chromium film on the surface of the Zr–1 wt % Nb alloy by reactive magnetron sputtering of a target leads to the formation of a zone of mutual penetration of chromium and zirconium. In this case, the grain sizes, as well as the sizes and distribution of particles of the β-Nb phase in the Zr–1 wt % Nb alloy, do not change. Isothermal diffusion annealing and irradiation with a pulsed electron beam result in an increase in the width of the zone of mutual penetration of chromium and zirconium compared to the state after deposition of a chromium film on the alloy surface. A comparative assessment of the chromium diffusion parameter sDb (s is the segregation coefficient, and Db is the grain boundary diffusion coefficient) under conditions of isothermal diffusion annealing and irradiation with a pulsed electron beam using the Whipple-Le-Clair equation with a grain boundary width of 0.5 nm was carried out. It has been shown that under conditions of simultaneous exposure to temperature and irradiation with a pulsed electron beam the sDb parameter increases and the activation energy of grain-boundary diffusion of chromium in the Zr–1 wt % Nb alloy decreases in the near-surface layer of the alloy Текстовый файл AM_Agreement |
| Gepubliceerd in: |
2024
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| Onderwerpen: | |
| Online toegang: | https://doi.org/10.1134/S1027451024701386 |
| Formaat: | Elektronisch Hoofdstuk |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=680318 |
| Samenvatting: | Title screen The diffusion of chromium from the surface was studied in a polycrystalline Zr–1 wt % Nb alloy under conditions of isothermal diffusion annealing and irradiation with a pulsed electron beam in the temperature range of (0.3–0.4) of the zirconium melting temperature using the high-frequency glow discharge optical emission spectrometry methods. It has been established that the deposition of a chromium film on the surface of the Zr–1 wt % Nb alloy by reactive magnetron sputtering of a target leads to the formation of a zone of mutual penetration of chromium and zirconium. In this case, the grain sizes, as well as the sizes and distribution of particles of the β-Nb phase in the Zr–1 wt % Nb alloy, do not change. Isothermal diffusion annealing and irradiation with a pulsed electron beam result in an increase in the width of the zone of mutual penetration of chromium and zirconium compared to the state after deposition of a chromium film on the alloy surface. A comparative assessment of the chromium diffusion parameter sDb (s is the segregation coefficient, and Db is the grain boundary diffusion coefficient) under conditions of isothermal diffusion annealing and irradiation with a pulsed electron beam using the Whipple-Le-Clair equation with a grain boundary width of 0.5 nm was carried out. It has been shown that under conditions of simultaneous exposure to temperature and irradiation with a pulsed electron beam the sDb parameter increases and the activation energy of grain-boundary diffusion of chromium in the Zr–1 wt % Nb alloy decreases in the near-surface layer of the alloy Текстовый файл AM_Agreement |
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| DOI: | 10.1134/S1027451024701386 |