Silicon adsorption on the (111) surface of TiN, AlN and TaN compounds; AIP Conference Proceedings; Vol. 2899, iss. 1 : Physical Mesomechanics of Condensed Matter: Physical Principles of Multiscale Structure Formation and the Mechanisms of Nonlinear Behavior (MESO 2022)

Dettagli Bibliografici
Parent link:AIP Conference Proceedings.— .— New York: AIP Publishing.— 0094-243X
Vol. 2899, iss. 1 : Physical Mesomechanics of Condensed Matter: Physical Principles of Multiscale Structure Formation and the Mechanisms of Nonlinear Behavior (MESO 2022).— 2023.— Article number 020080, 6 p.
Autore principale: Koroteev Yu. M. Yuri Mikhailovich
Altri autori: Svyatkin L. A. Leonid Aleksandrovich, Ognev S. O. Sergey Olegovich
Riassunto:Title screen
The interaction of a Si atom with the (111) surface of AlN, TiN, and TaN compounds has been studied using ab initio calculations. The most energetically favorable adsorption positions of Si atoms were found to be FCC and HCP holes. It was shown that silicon atoms have the highest binding energies on the AlN(111) and TiN(111) surfaces terminated by nitrogen atoms and on the TaN(111) surface terminated by tantalum. The valence electron density distribution has been studied to identify the type of Si atom bond with the (111) surface of AlN, TiN, and TaN compounds
Текстовый файл
AM_Agreement
Lingua:inglese
Pubblicazione: 2023
Soggetti:
Accesso online:https://doi.org/10.1063/5.0162851
Natura: Elettronico Capitolo di libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=680118

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330 |a The interaction of a Si atom with the (111) surface of AlN, TiN, and TaN compounds has been studied using ab initio calculations. The most energetically favorable adsorption positions of Si atoms were found to be FCC and HCP holes. It was shown that silicon atoms have the highest binding energies on the AlN(111) and TiN(111) surfaces terminated by nitrogen atoms and on the TaN(111) surface terminated by tantalum. The valence electron density distribution has been studied to identify the type of Si atom bond with the (111) surface of AlN, TiN, and TaN compounds 
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