Features of adsorption of silicon on TiN(111) compound in presence of substitution impurities Al and Ta: first principle calculations; Перспективы развития фундаментальных наук; Т. 1 : Физика

Features of adsorption of silicon on TiN(111) compound in presence of substitution impurities Al and Ta: first principle calculations; Перспективы развития фундаментальных наук; Т. 1 : Физика

Bibliografiske detaljer
Parent link:	Перспективы развития фундаментальных наук=Prospects of Fundamental Sciences Development: сборник научных трудов XXI Международной конференции студентов, аспирантов и молодых ученых, г. Томск, 23-26 апреля 2024 г./ Национальный исследовательский Томский политехнический университет ; под ред. И. А. Курзиной [и др.].— .— Томск: Изд-во ТПУ Т. 1 : Физика.— 2024.— С. 386-388
Hovedforfatter:	Ognev S. O. Sergey Olegovich
Institution som forfatter:	Национальный исследовательский Томский политехнический университет (570)
Andre forfattere:	Svyatkin L. A. Leonid Aleksandrovich (научный руководитель), Bolsunovskaya L. M. Ludmila Mihailovna
Summary:	Заглавие с экрана We present the results of an ab initio study of silicon adsorption on the (111) surface of TiN with NaCl structure in the presence of substitutional impurities Al and Ta. All possible symmetric non-equivalent positions of the silicon atom on the (111) surface with titanium and nitrogen terminations were considered, and the binding energy of the silicon atom in these positions was calculated. The most energetically favorable positions for adsorption on the considered (111) surface were determined Текстовый файл
Sprog:	engelsk
Udgivet:	2024
Fag:	труды учёных ТПУ электронный ресурс titanium nitride silicon protective wear-resistant coating adsorption of silicon
Online adgang:	http://earchive.tpu.ru/handle/11683/80513
Format:	Electronisk Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=674926

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