Periodic renucleation as an approach to improving the tribological properties of CVD diamond films; Tribology International; Vol. 200

Opis bibliograficzny
Parent link:Tribology International.— .— Amsterdam: Elsevier Science Publishing Company Inc.
Vol. 200.— 2024.— Article number 110087, 7 p.
Korporacja: National Research Tomsk Polytechnic University (570)
Kolejni autorzy: Mitulinsky A. S. Aleksandr Sergeevich, Gaydaychuk A. V. Alexander Valerievich, Zenkin S. P. Sergey Petrovich, Meysner S. N. Stanislav Nikolaevich, Bulakh V. A. Vlada Aleksandrovna, Linnik S. A. Stepan Andreevich
Streszczenie:This study investigates an approach to enhancing the tribological properties of CVD diamond films by modifying their structure. The approach is based on periodic renucleation of the film during the synthesis process. A comparative analysis was conducted with films of a microcrystalline structure and a standard multilayer structure, consisting of alternating microcrystalline and nanocrystalline diamond layers. The results demonstrate that the periodically renucleated diamond film retains all the features of the multilayer structure, including low surface roughness of 311 nm, tensile residual stress of 2.8 GPa, low coefficient of friction of 0.08, and low wear rate of counter body of 2.19 × 10−6 mm3N−1m−1. Moreover, the periodically renucleated diamond film exhibits significantly improved wear resistance, with a 43 % lower wear rate compared to standard multilayer film.
Текстовый файл
AM_Agreement
Język:angielski
Wydane: 2024
Hasła przedmiotowe:
Dostęp online:https://doi.org/10.1016/j.triboint.2024.110087
Format: Elektroniczne Rozdział
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=674345

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