Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering; Materials; Vol. 17, iss. 12

Oxidation Performance of Nano-Layered (AlTiZrHfTa)Nx/SiNx Coatings Deposited by Reactive Magnetron Sputtering; Materials; Vol. 17, iss. 12

Bibliographische Detailangaben
Parent link:Materials.— .— Basel: MDPI AG
Vol. 17, iss. 12.— 2024.— Article number 2799, 24 p.
Körperschaft: National Research Tomsk Polytechnic University (570)
Weitere Verfasser: Touaibia D. E. Djallel Eddine, Achache S. Sofiane, Bouissil A. Abdelhakim, Parent F. Fabrice, Ghanbaja J. Jaafar, Gorbunova A. Alina, Postnikov P. S. Pavel Sergeevich, Chehimi M. Mohamed, Schuster F. Frederic, Sanchette F. Frederic, El G. M. Garah Mohamed
Zusammenfassung:Title screen
This work uses the direct current magnetron sputtering (DCMS) of equi-atomic (AlTiZrHfTa) and Si targets in dynamic sweep mode to deposit nano-layered (AlTiZrHfTa)Nx/SiNx refractory high-entropy coatings (RHECs). Transmission electron microscopy (TEM), field emission scanning electron microscopy (FESEM), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) are used to investigate the effect of Si addition on the oxidation behavior of the nano-layered coatings. The Si-free nitride coating exhibits FCC structure and columnar morphology, while the Si-doped nitride coatings present a FCC (AlTiZrHfTa)N/amorphous-SiNx nano-layered architecture. The hardness decreases from 24.3 ± 1.0 GPa to 17.5 ± 1.0 GPa because of the nano-layered architecture, whilst Young’s modulus reduces from 188.0 ± 1.0 GPa to roughly 162.4 ± 1.0 GPa. By increasing the thickness of the SiNx nano-layer, kp values decrease significantly from 3.36 × 10−8 g2 cm−4 h−1 to 6.06 × 10−9 g2 cm−4 h−1. The activation energy increases from 90.8 kJ·mol−1 for (AlTiZrHfTa)Nx nitride coating to 126.52 kJ·mol−1 for the (AlTiZrHfTa)Nx/SiNx nano-layered coating. The formation of a FCC (AlTiZrHfTa)-Nx/a-SiNx nano-layered architecture results in the improvement of the resistance to oxidation at high temperature.
Текстовый файл
Sprache:Englisch
Veröffentlicht: 2024
Schlagworte:
электронный ресурс
труды учёных ТПУ
high-entropy alloys
coatings
magnetron sputtering
(AlTiZrHfTa)/SiNx
oxidation
nano-layered
Online-Zugang:https://doi.org/10.3390/ma17122799
Format: Elektronisch Buchkapitel
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=673582

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