Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating

Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating

書誌詳細
Parent link:Russian Physics Journal.— .— New York: Springer Science+Business Media LLC.
№ 11 - Vol. 65.— 2023.— P. 1825-1831
団体著者: National Research Tomsk Polytechnic University
その他の著者: Grenadyorov A. S. Aleksandr Sergeevich, Zakharov A. N. Aleksandr Nikolaevich, Oskirko V. O. Vladimir Olegovich, Sidelev D. V. Dmitry Vladimirovich, Oskomov K. V. Konstantin Vladimirovich, Solovjev A. A. Andrey Aleksandrovich
要約:The paper suggests dependences of the energy flux and specific energy onto the substrate on the pulse duty cycle during the dual magnetron-sputter deposition of the TiAlN coating. It is shown that the energy flux at the substrate increases by 20–30% with decreasing duty cycle from 40 to 6% at the constant average discharge power. Together with a decrease in the deposition rate at the high pulsed power, the specific energy grows sixfold on the substrate during the coating growth. The duty cycle can be thus considered as a way to control the energy flux onto the deposited coating, which affects its structure and properties. It is found that the TiAlN coating obtained at low duty cycle and high energy flux onto the substrate, possesses the high hardness and wear resistance.
Текстовый файл
出版事項: 2023
主題:
dual magnetron sputtering
TiAlN coating
energy flux
hardness
wear resistance
труды учёных ТПУ
электронный ресурс
オンライン･アクセス:https://doi.org/10.1007/s11182-023-02837-z
フォーマット: 電子媒体 図書の章
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=672777

類似資料

類似資料