Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating; Russian Physics Journal; № 11 - Vol. 65

Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating; Russian Physics Journal; № 11 - Vol. 65

Bibliographische Detailangaben
Parent link:Russian Physics Journal.— .— New York: Springer Science+Business Media LLC.
№ 11 - Vol. 65.— 2023.— P. 1825-1831
Körperschaft: Томский политехнический университет
Weitere Verfasser: Grenadyorov A. S. Aleksandr Sergeevich, Zakharov A. N. Aleksandr Nikolaevich, Oskirko V. O. Vladimir Olegovich, Sidelev D. V. Dmitry Vladimirovich, Oskomov K. V. Konstantin Vladimirovich, Solovjev A. A. Andrey Aleksandrovich
Zusammenfassung:The paper suggests dependences of the energy flux and specific energy onto the substrate on the pulse duty cycle during the dual magnetron-sputter deposition of the TiAlN coating. It is shown that the energy flux at the substrate increases by 20–30% with decreasing duty cycle from 40 to 6% at the constant average discharge power. Together with a decrease in the deposition rate at the high pulsed power, the specific energy grows sixfold on the substrate during the coating growth. The duty cycle can be thus considered as a way to control the energy flux onto the deposited coating, which affects its structure and properties. It is found that the TiAlN coating obtained at low duty cycle and high energy flux onto the substrate, possesses the high hardness and wear resistance.
Текстовый файл
Sprache:Englisch
Veröffentlicht: 2023
Schlagworte:
dual magnetron sputtering
TiAlN coating
energy flux
hardness
wear resistance
труды учёных ТПУ
электронный ресурс
Online-Zugang:https://doi.org/10.1007/s11182-023-02837-z
Format: Elektronisch Buchkapitel
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=672777

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