Structure, mechanical and tribological properties of Ti-doped and Cr-doped a-C:H:SiOx coatings; Vacuum; Vol. 219, Pt. A

Bibliografski detalji
Parent link:Vacuum.— .— Amsterdam: Elsevier Science Publishing Company Inc.
Vol. 219, Pt. A.— 2024.— Article number 112706, 13 p.
Autor kompanije: Томский политехнический университет
Daljnji autori: Grenaderov A. S. Aleksandr Sergeevich, Solovjev A. A. Andrey Aleksandrovich, Oskirko V. O. Vladimir Olegovich, Oskomov K. V. Konstantin Vladimirovich, Semenov V. A. Vyacheslav Arkadjevich, Sypchenko V. S. Vladimir Sergeevich, Saraev A. A. Andrey Aleksandrovich
Sažetak:Title screen
The work is devoted to the deposition of Ti- and Cr-doped a-C:H:SiOx coatings on WC-8Co substrates using plasma-assisted chemical vapor deposition and magnetron sputtering methods. The structure, surface morphology, mechanical and tribological properties of coatings are investigated depending on the Ti or Cr content. It is shown that only a small concentration of Ti or Cr in coatings improves their mechanical and tribological properties compared to undoped coatings. The addition of 0.8 at.% Ti to the a-C:H:SiOx coating reduces its wear rate by 3 times, and the addition of 3 at.% Cr to the a-C:H:SiOx coating reduces its friction coefficient by 30% and the wear rate by 10 times. According to VDI 3198 standard, the Ti- and Cr-doped a-C:H:SiOx coatings with a low concentration of metals have the adhesive strength quality HF1. At higher metal concentrations, the properties of the coatings deteriorate due to graphitization of the carbon structure
AM_Agreement
Jezik:engleski
Izdano: 2024
Teme:
Online pristup:https://doi.org/10.1016/j.vacuum.2023.112706
Format: Elektronički Poglavlje knjige
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=672347

MARC

LEADER 00000nla0a2200000 4500
001 672347
005 20260727134434.0
090 |a 672347 
100 |a 20240417a2024 k||y0engy50 ba 
101 0 |a eng 
102 |a NL 
135 |a drcn ---uucaa 
181 0 |a i   |b  e  
182 0 |a b 
183 0 |a cr  |2 RDAcarrier 
200 1 |a Structure, mechanical and tribological properties of Ti-doped and Cr-doped a-C:H:SiOx coatings  |f A. S. Grenadyorov, А. А. Solovyev, V. O. Oskirko [et al.] 
203 |a Текст  |c электронный  |b визуальный 
283 |a online_resource  |2 RDAcarrier 
300 |a Title screen 
320 |a References: 63 tit 
330 |a The work is devoted to the deposition of Ti- and Cr-doped a-C:H:SiOx coatings on WC-8Co substrates using plasma-assisted chemical vapor deposition and magnetron sputtering methods. The structure, surface morphology, mechanical and tribological properties of coatings are investigated depending on the Ti or Cr content. It is shown that only a small concentration of Ti or Cr in coatings improves their mechanical and tribological properties compared to undoped coatings. The addition of 0.8 at.% Ti to the a-C:H:SiOx coating reduces its wear rate by 3 times, and the addition of 3 at.% Cr to the a-C:H:SiOx coating reduces its friction coefficient by 30% and the wear rate by 10 times. According to VDI 3198 standard, the Ti- and Cr-doped a-C:H:SiOx coatings with a low concentration of metals have the adhesive strength quality HF1. At higher metal concentrations, the properties of the coatings deteriorate due to graphitization of the carbon structure 
371 0 |a AM_Agreement 
461 1 |t Vacuum  |c Amsterdam  |n Elsevier Science Publishing Company Inc. 
463 1 |t Vol. 219, Pt. A  |v Article number 112706, 13 p.  |d 2024 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a a-C:H:SiOx coatings 
610 1 |a Me-doped DLC 
610 1 |a PACVD 
610 1 |a magnetron sputtering 
610 1 |a hardness 
610 1 |a wear resistance 
610 1 |a adhesive strength 
701 1 |a Grenaderov  |b A. S.  |g Aleksandr Sergeevich 
701 1 |a Solovjev   |b A. A.  |g Andrey Aleksandrovich 
701 1 |a Oskirko   |b V. O.  |g Vladimir Olegovich 
701 1 |a Oskomov  |b K. V.  |g Konstantin Vladimirovich 
701 1 |a Semenov  |b V. A.  |g Vyacheslav Arkadjevich 
701 1 |a Sypchenko  |b V. S.  |c physicist  |c Associate Professor of Tomsk Polytechnic University, Candidate of Sciences  |f 1987-  |g Vladimir Sergeevich  |9 17389 
701 1 |a Saraev  |b A. A.  |g Andrey Aleksandrovich 
712 0 2 |a Томский политехнический университет  |c 1991-  |9 26305 
801 0 |a RU  |b 63413507  |c 20240417  |g RCR 
856 4 |u https://doi.org/10.1016/j.vacuum.2023.112706  |z https://doi.org/10.1016/j.vacuum.2023.112706 
942 |c CR