Effects of annealing in vacuum on the microstructure of silicon-containing calcium phosphate films deposited on a ZrNb alloy by radio-frequency magnetron sputtering; Vacuum; Vol. 212

Effects of annealing in vacuum on the microstructure of silicon-containing calcium phosphate films deposited on a ZrNb alloy by radio-frequency magnetron sputtering; Vacuum; Vol. 212

Bibliografiset tiedot
Parent link:Vacuum
Vol. 212.— 2023.— [112028, 11 p.]
Yhteisötekijä: Национальный исследовательский Томский политехнический университет Исследовательская школа химических и биомедицинских технологий
Muut tekijät: Surmeneva M. A. Maria Alexandrovna, Prosolov K. A. Konstantin Alexandrovich, Glukhov I. Ivan, Grubova I. Yu. Irina Yurievna, Botvin V. V. Vladimir Viktorovich, Surmenev R. A. Roman Anatolievich, Sharkeev Yu. P. Yury Petrovich
Yhteenveto:Title screen
Coatings were deposited on the surface of a ZrNb alloy by radio-frequency magnetron sputtering using targets consisting of either pure crystalline hydroxyapatite (HA) or silicon-containing HA (Si-HA). The coated ZrNb samples were heated in a vacuum furnace at a pressure of 5 ? 10?5 Torr and temperature 700 °C for 2 h. Precursor powders of silicate-substituted HA [Ca10(PO4)6?x(SiO4)x(OH)2?x, x = 0, 0.5, or 1.72] were used to fabricate the targets for sputtering. The aim of this study was to analyze the effect of Si addition to HA on crystallization behavior and structure of the resulting films using transmission electron microscopy and electron diffraction patterns of selected sites. The average thickness of the films was in the range of 175–345 nm. The Si substitution in HA played a major role in the mechanisms of coating formation and crystallization behavior, which influenced the structure and crystallinity of the layers deposited by radio-frequency magnetron sputtering. Moreover, the results indicate that surface-induced crystallization of the deposited thin films is more pronounced than internal crystallization. A possible mechanism underlying the observed decrease in the crystallization rate with the increasing silicate content in the HA-based films is discussed.
Режим доступа: по договору с организацией-держателем ресурса
Kieli:englanti
Julkaistu: 2023
Aiheet:
электронный ресурс
труды учёных ТПУ
silicon-containing hydroxyapatite
radio-frequency magnetron sputtering
coatingZrNb alloy
гидроксиапатиты
магнетронное напыление
Linkit:https://doi.org/10.1016/j.vacuum.2023.112028
Aineistotyyppi: Elektroninen Kirjan osa
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=669362

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