Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow; Coatings; Vol. 13, iss. 2

Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow; Coatings; Vol. 13, iss. 2

書誌詳細
Parent link:	Coatings Vol. 13, iss. 2.— 2023.— [380, 10 p.]
団体著者:	Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов
その他の著者:	Sedov V. Vadim, Popovich A. Alexey, Linnik S. A. Stepan Andreevich, Martyanov A. Artem, Wei J. Junjun, Zenkin S. P. Sergey Petrovich, Zavedeev E. Evgeny, Savin S. Sergey, Gaydaychuk A. V. Alexander Valerievich, Li Ch. Chengming, Ralchenko V. Victor, Konov V. Vitaly
要約:	Title screen A combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m?K in comparison to 130 W/m?K for the 93 µm-thick pure HF CVD film.
言語:	英語
出版事項:	2023
主題:	электронный ресурс труды учёных ТПУ diamond thin film chemical vapor deposition microwave plasma thermal conductivity Raman spectroscopy алмаз тонкие пленки химическое осаждение микроволновая плазма теплопроводность рамановская спектроскопия
オンライン･アクセス:	http://earchive.tpu.ru/handle/11683/74890 https://doi.org/10.3390/coatings13020380
フォーマット:	電子媒体図書の章
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=669256

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