Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow; Coatings; Vol. 13, iss. 2
| Parent link: | Coatings Vol. 13, iss. 2.— 2023.— [380, 10 p.] |
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| Erakunde egilea: | |
| Beste egile batzuk: | , , , , , , , , , , , |
| Gaia: | Title screen A combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m?K in comparison to 130 W/m?K for the 93 µm-thick pure HF CVD film. |
| Hizkuntza: | ingelesa |
| Argitaratua: |
2023
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| Gaiak: | |
| Sarrera elektronikoa: | http://earchive.tpu.ru/handle/11683/74890 https://doi.org/10.3390/coatings13020380 |
| Formatua: | Baliabide elektronikoa Liburu kapitulua |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=669256 |
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| 200 | 1 | |a Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow |f V. Sedov, A. Popovich, S. A. Linnik [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 56 tit.] | ||
| 330 | |a A combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m?K in comparison to 130 W/m?K for the 93 µm-thick pure HF CVD film. | ||
| 461 | |t Coatings | ||
| 463 | |t Vol. 13, iss. 2 |v [380, 10 p.] |d 2023 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a diamond | |
| 610 | 1 | |a thin film | |
| 610 | 1 | |a chemical vapor deposition | |
| 610 | 1 | |a microwave plasma | |
| 610 | 1 | |a thermal conductivity | |
| 610 | 1 | |a Raman spectroscopy | |
| 610 | 1 | |a алмаз | |
| 610 | 1 | |a тонкие пленки | |
| 610 | 1 | |a химическое осаждение | |
| 610 | 1 | |a микроволновая плазма | |
| 610 | 1 | |a теплопроводность | |
| 610 | 1 | |a рамановская спектроскопия | |
| 701 | 1 | |a Sedov |b V. |g Vadim | |
| 701 | 1 | |a Popovich |b A. |g Alexey | |
| 701 | 1 | |a Linnik |b S. A. |c physicist |c Engineer-Researcher of Tomsk Polytechnic University |f 1985- |g Stepan Andreevich |3 (RuTPU)RU\TPU\pers\32877 |9 16725 | |
| 701 | 1 | |a Martyanov |b A. |g Artem | |
| 701 | 1 | |a Wei |b J. |g Junjun | |
| 701 | 1 | |a Zenkin |b S. P. |c physicist |c Researcher of Tomsk Polytechnic University |f 1988- |g Sergey Petrovich |3 (RuTPU)RU\TPU\pers\41880 | |
| 701 | 1 | |a Zavedeev |b E. |g Evgeny | |
| 701 | 1 | |a Savin |b S. |g Sergey | |
| 701 | 1 | |a Gaydaychuk |b A. V. |c physicist |c Postgraduate, Engineer - Researcher of Tomsk Polytechnic University |f 1984- |g Alexander Valerievich |3 (RuTPU)RU\TPU\pers\32876 |9 16724 | |
| 701 | 1 | |a Li |b Ch. |g Chengming | |
| 701 | 1 | |a Ralchenko |b V. |g Victor | |
| 701 | 1 | |a Konov |b V. |g Vitaly | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Исследовательская школа физики высокоэнергетических процессов |c (2017- ) |3 (RuTPU)RU\TPU\col\23551 |
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| 856 | 4 | |u https://doi.org/10.3390/coatings13020380 | |
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