Combined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow
| Parent link: | Coatings Vol. 13, iss. 2.— 2023.— [380, 10 p.] |
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| 企業作者: | |
| 其他作者: | , , , , , , , , , , , |
| 總結: | Title screen A combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m?K in comparison to 130 W/m?K for the 93 µm-thick pure HF CVD film. |
| 語言: | 英语 |
| 出版: |
2023
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| 主題: | |
| 在線閱讀: | http://earchive.tpu.ru/handle/11683/74890 https://doi.org/10.3390/coatings13020380 |
| 格式: | 電子 Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=669256 |
| 總結: | Title screen A combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m?K in comparison to 130 W/m?K for the 93 µm-thick pure HF CVD film. |
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| DOI: | 10.3390/coatings13020380 |